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Centro de Componentes Semicondutores
Produções / Resumos Publicados
Resumos publicados em anais de congressos
Nacional
1.
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SOUZA, J. F.; MOREIRA, M. A.; DOI, I.; DINIZ, J. A.; TATSCH, Peter Jurgen; Growth and characterization of TiO2 thin films prepared by DC reactive magnetron sputter at room temperature, 09/2011, X Encontro Anual da Sociedade Brasileira de Pesquisa em Materiais (SBPMat),Vol. 1, pp.101-101, Gramado, RS, Brasil, 2011 *
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Internacional
1.
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LIMA, L. P. B.; DINIZ, J. A.; RADTKE, C.; DOI, I.; MIYOSHI, Juliana; SILVA, A. R.; GODOY FILHO, J.; Structural and Electrical Characteristics of TaN Film Deposited by DC Sputtering for MOS Capacitor and Schottky Diode Upper Electrodes, 11/2011, 58th Annual International Symposium and Exhibition - AVS 2011,Vol. 1, pp.243-243, Tennessee, Estados Unidos da América, 2011. Resumo expandido *
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2.
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MIYOSHI, Juliana; SILVA, A. R.; CAVARSAN, F. A.; DINIZ, J. A.; LIMA, L. P. B.; TiAlO and TiAlON Obtained by e-Beam Evaporation with Additional Electron Cyclotron Resonance (ECR) Plasma Oxidation and Oxynitridation on Si for MOS Gate Dielectric, 11/2011, 58th Annual International Symposium and Exhibition - AVS 2011,Vol. 1, pp.243-243, Tennessee, Estados Unidos da América, 2011. Resumo expandido *
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3.
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SILVA, A. R.; MIYOSHI, Juliana; CAVARSAN, F. A.; LIMA, L. P. B.; DINIZ, J. A.; Surface Texturing of Silicon for Solar Cells for CMOS Technology, 11/2011, 58th Annual International Symposium and Exhibition - AVS 2011,Vol. 1, pp.247-247, Tennessee, Estados Unidos da América, 2011. Resumo expandido *
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4.
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LIMA, L. P. B.; DINIZ, J. A.; RADTKE, C.; DOI, I.; MIYOSHI, Juliana; SILVA, A. R.; GODOY FILHO, J.; Structural and Electrical Characteristics of TiN Film Deposited by DC Sputtering for MOS Capacitor and Schottky Diode Upper Electrodes, 10/2011, 58th Annual International Symposium and Exhibition - AVS 2011,Vol. 1, pp.243-243, Tennessee, Estados Unidos da América, 2011. Resumo expandido *
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5.
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SOUZA, J. F.; MOREIRA, M. A.; DOI, I.; DINIZ, J. A.; TATSCH, Peter Jurgen; Preparation and Characterization of High-k Tantalum Pentoxide (Ta2O5) Thin Film for Sensors and Integrated Circuits Applications, 08/2011, 24th International Conference on Amorphous and Nanocrystalline Semiconductors - ICANS 24,Vol. 1, pp.282-282, Nara, Japão, 2011. Resumo expandido *
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6.
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GOMES, A. L.; CAMPOS, João Sinézio de C.; ZAKIA, M. B. P.; DINIZ, J. A.; Characterization of conducting nanocomposites with poly(vinylidine fluoride) used in devices electroluminescents, 07/2011, European Polymer Congress (EPF) 2011, XII GEP Congress,Vol. 1, pp.1-3, Granada, Espanha, 2011
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7.
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LIMA, L. P. B.; MOREIRA, M. A.; DINIZ, J. A.; DOI, I.; Titanium Nitride Deposited by DC Sputtering for MOS Gate Electrode Application, 07/2011, International Conference on the Formation of Semiconductor Interfaces 2011 - ICFSI-13,Vol. 1, pp.230-230, Praga, República Tcheca, 2011. Resumo expandido *
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8.
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SOUZA, J. F.; MOREIRA, M. A.; DOI, I.; DINIZ, J. A.; TATSCH, Peter Jurgen; GONÇALVES, J.L.; Preparation and characterization of high-k Aluminum nitride (AlN) thin film for sensors and integrated circuits applications, 07/2011, International Conference on the Formation of Semiconductor Interfaces 2011 - ICFSI-13,Vol. 1, pp.1-1, Praga, República Tcheca, 2011. Resumo expandido *
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9.
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LIMA, L. P. B.; MOREIRA, M. A.; DINIZ, J. A.; DOI, I.; Titanium Nitride Deposited by DC Sputtering for MOS Gate Electrode Application, 07/2011, International Conference on the Formation of Semiconductor Interfaces 2011 - ICFSI-13,Vol. 1, pp.1-1, Praga, República Tcheca, 2011. Resumo expandido *
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* Esta produção está associada também a outros órgãos
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