ROSA, A. M.; LEONHARDT, A.; SOUZA, L. O.; PETERSEN BARBOSA LIMA, Lucas; SANTOS, M. V. P.; MANERA, L. T.; DINIZ, J. A.; LIMA, L. P. B.; A novel self-aligned double patterning integrated with Ga+ focused ion beam milling for silicon nanowire definition, 01/2021, Microelectronic Engineering, Vol. 237, Fac. 11/12, pp.111493-111500, Holanda, HOLANDA, 2021
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ROSA, A. M.; LEONHARDT, Adriana; SOUZA, L. O.; LIMA, L. P. B.; SANTOS, M. V. P.; MANERA, LEANDRO TIAGO; DINIZ, J. A.; A novel self-aligned double patterning integrated with Ga+ focused ion beam milling for silicon nanowire definition., 01/2021, Journal of Magnetism and Magnetic Materials, Vol. 237, pp.1-9, Amsterdam, HOLANDA, 2021
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ALVAREZ, H. S.; SILVA, A. R.; CIOLDIN, F. H.; ESPINDOLA, L. C. J.; DINIZ, J. A.; Hydrogenated amorphous silicon films deposited by electron cyclotron resonance chemical vapor deposition at room temperature with different radio frequency chuck powers, 11/2019, Thin Solid Films, Vol. 690, pp.137534-137534, Lausanne, SUICA, 2019
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SANTOS, M. V. P.; SZKUDLAREK, A.; PIROTA, K. R.; DINIZ, J. A.; UTKE, Ivo; MOSHKALEV, Stanislav; Comparative study of post-growth annealing of Cu(hfac) 2 , Co 2 (CO) 8 and Me 2 Au(acac) metal precursors deposited by FEBID, 01/2018, Beilstein Journal of Nanotechnology, Vol. 9, pp.91-101, Frankfurt am Main, ALEMANHA, 2018
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P. NEMER, J.; SANTOS, M. V. P.; DINIZ, J. A.; PAVANELLO, M. A.; PAVANELLO, M. A.; Back-Biased Undoped Nanowire-Based FETs in Silicon-On-Insulator Substrates with Nanometric Thicknesses, 01/2018, Journal of Nanoelectronics and Optoelectronics, Vol. 13, Fac. 2, pp.178-182, Valencia, CA, ESTADOS UNIDOS DA AMERICA, 2018
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CÉSAR, R. R.; MARQUE, A. M. P.; DOI, I.; DINIZ, J. A.; Electrolyte-insulator-semiconductor devices with different integrated reference electrodes for p H detection, 01/2018, Journal of Vacuum Science and Technology. Part B. Nanotechnology & Microelectronics, Vol. 36, Fac. 3, Melville, NY, ESTADOS UNIDOS DA AMERICA, 2018
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SANTOS, M. V. P.; BARTH, Sven; BERON, F.; PIROTA, K. R.; PINTO, A.L.; SINNECKER, J.P.; MOSHKALEV, Stanislav; DINIZ, J. A.; UTKE, Ivo; Magnetoelectrical Transport Improvements of Postgrowth Annealed Iron-Cobalt Nanocomposites: A Possible Route for Future Room-Temperature Spintronics, 06/2018, ACS Applied Nano Materials, Vol. 1, Fac. 7, pp.3364-3374, Washington, DC, ESTADOS UNIDOS DA AMERICA, 2018
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SANTOS, M. V. P.; SZKUDLAREK, A.; RYDOSZ, Artur; GUERRA-NUNEZ, Carlos; BEST, James P.; BERON, F.; PIROTA, K. R.; MOSHKALEV, Stanislav; DINIZ, J. A.; Comparative study of post-growth annealing of Cu(hfac), Co(CO) and Me Au(acac) metal precursors deposited by FEBID, 01/2018, Physical Review B: covering condensed matter and materials physics (Online), Vol. 9, pp.91-101, Gaithersburg, ESTADOS UNIDOS DA AMERICA, 2018
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NEDEV, N.; CURIEL, M.; VALDEZ, B.; MONTERO, G.; MATEOS, D.; DINIZ, J. A.; MUNOZ, S. N. M.; MEDEROS, Melissa; Thin SiO 2 /a-Si:H/SiO 2 multilayer insulators obtained by electron cyclotron resonance chemical vapor deposition at room temperature for possible application in non-volatile memories, 03/2017, Thin Solid Films, Vol. 628, pp.96-100, Lausanne, SUICA, 2017
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SANTOS, M. V. P.; DINIZ, J. A.; UTKE, Ivo; VELO, M. F.; DOMINGOS, R. D.; ZHANG, Yu.; MAEDER, Xavier; GUERRA-NUNEZ, Carlos; BEST, James P.; BERON, F.; PIROTA, K. R.; MOSHKALEV, Stanislav; Annealing-Based Electrical Tuning of Cobalt–Carbon Deposits Grown by Focused-Electron-Beam-Induced Deposition, 11/2016, ACS Applied Materials & Interfaces (Print), Vol. 8, Fac. 47, pp.32496-32503, Washington, ESTADOS UNIDOS DA AMERICA, 2016
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LEONHARDT, A.; SANTOS, M. V. P.; DINIZ, J. A.; MANERA, L. T.; LIMA, L. P. B.; Ga+ focused ion beam lithography as a viable alternative for multiple fin field effect transistor prototyping, 11/2016, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures Processing, Measurement and Phenomena, Vol. 34, Fac. 6, New York, ESTADOS UNIDOS DA AMERICA, 2016
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LANG, R.; MEDEROS, Melissa; MUNOZ, S. N. M.; DOI, I.; DINIZ, J. A.; Germanium nanoparticles grown at different deposition times for memory device applications, 07/2016, Thin Solid Films, Vol. 611, pp.39-45, Lausanne, SUICA, 2016
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SANTOS, M. V. P.; VELO, M. F.; DOMINGOS, R. D.; BETTINI, J.; DINIZ, J. A.; BERON, F.; PIROTA, K. R.; Electrodeposited nickel nanowires for magnetic-field effect transistor (MagFET), 01/2016, JICS. Journal of Integrated Circuits and Systems (Ed. Português), Vol. 11, Fac. 1, pp.13-18, Porto Alegre, RS, BRASIL, 2016
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SANTOS, M. V. P.; LIMA, L. P. B.; MAYER, R. A.; BERON, Fany; PIROTA, K. R.; DINIZ, J. A.; Dielectrophoretic manipulation of individual nickel nanowires for electrical transport measurements, 05/2015, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures Processing, Measurement and Phenomena, Vol. 33, Fac. 3, pp.1-8, New York, ESTADOS UNIDOS DA AMERICA, 2015
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SANTOS, M. V. P.; LIMA, L. P. B.; MAYER, R. A.; BERON, F.; PIROTA, K. R.; DINIZ, J. A.; Dielectrophoretic manipulation of individual nickel nanowires for electrical transport measurements, 05/2015, Journal of Vacuum Science and Technology. Part B. Nanotechnology & Microelectronics, Vol. 33, Fac. 3, pp.31804-31804, Melville, NY, ESTADOS UNIDOS DA AMERICA, 2015
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MEDEROS, Melissa; MUNOZ, S. N. M.; DOI, I.; DINIZ, J. A.; Effects of temperature and deposition time on the structural and optical properties of Si-1 - Ge-x(x) nanoparticles grown by low pressure chemical vapor deposition, 03/2015, Thin Solid Films, Vol. 579, pp.116-122, Lausanne, SUICA, 2015
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MARQUE, A. M. P.; SOUZA, J.F.; FONSECA, L. R. C; DINIZ, J. A.; Experimental and theoretical investigation of the superior contact properties of dielectrophoretically processed graphene and tantalum nitride electrodes, 12/2014, Physica Status Solidi. B, Basic Research, Vol. 252, Fac. 4, pp.765-772, Berlin, ALEMANHA, 2014
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SODRE, Arismar Cerqueira Jr; COSTA, I. F.; MANERA, L. T.; DINIZ, J. A.; Optically Controlled Reconfigurable Antenna Array Based on E-Shaped Elements, 04/2014, International Journal of Antennas and Propagation (Print), Vol. 2014, Fac. 2, pp.1-8, New York, ESTADOS UNIDOS DA AMERICA, 2014
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LIMA, L. P. B.; F. W. DEKKERS, H.; G. LISONI, J.; DINIZ, J. A.; VAN ELSHOCHT, S.; DE GENDT, S.; Metal gate work function tuning by Al incorporation in TiN, 02/2014, Journal of Applied Physics, Vol. 115, Fac. 7, pp.74504-74504, New York, ESTADOS UNIDOS DA AMERICA, 2014
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SILVA, A. R.; MIYOSHI, Juliana; DINIZ, J. A.; DOI, I.; GODOY FILHO, J.; The Surface Texturing of Monocrystalline Silicon with NH4OH and Ion Implantation for Applications in Solar Cells Compatible with CMOS Technology, 01/2014, Energy Procedia, Vol. 44, pp.132-137, Oxford, REINO UNIDO, 2014
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CÉSAR, R. R.; BARROS, Angélica Denardi de; NASCIMENTO, R. O.; ALVES,, O.L..; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; ALVES,, O.L.; Electrolyte-Insulator-Semiconductor Structure for Pb+ Detecting, 01/2014, Procedia Engineering, Vol. 87, pp.188-191, Amsterdam, HOLANDA, 2014
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SILVA, A. R.; MIYOSHI, Juliana; DINIZ, J. A.; DOI, I.; GODOY FILHO, J.; The Surface Texturing of Monocrystalline Silicon with NH4OH and Ion Implantation for Applications in Solar Cells Compatible with CMOS Technology, 05/2013, Energy Procedia, Vol. 44, pp.132-137, Oxford, REINO UNIDO, 2013
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LIMA, L. P. B.; DINIZ, J. A.; RADTKE, Claudio; SANTOS, M. V. P.; DOI, I.; GODOY FILHO, J.; Influence of Al/TiN/SiO2 structure on MOS capacitor, Schottky diode, and fin field effect transistors devices, 01/2013, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures Processing, Measurement and Phenomena, Vol. 31, pp.52202-52202, New York, ESTADOS UNIDOS DA AMERICA, 2013
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SANTOS, M. V. P.; LIMA, L. P. B.; DINIZ, J. A.; GODOY FILHO, J.; Fabrication of p-type silicon nanowires for 3D FETs using focused ion beam, 01/2013, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures Processing, Measurement and Phenomena, Vol. 31, pp.1-6, New York, ESTADOS UNIDOS DA AMERICA, 2013
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CIOLDIN, F. H.; LIMA, L. P. B.; DOI, I.; DINIZ, J. A.; GODOY FILHO, J.; A. ZAMBOTTI, Eduardo; Investigation of Thermal Stability of Titanium Nitride Using a RTA Process, 12/2012, ECS Transactions (Online), Vol. 49, pp.407-413, Philadelphia, PA, ESTADOS UNIDOS DA AMERICA, 2012
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LIMA, L. P. B.; V. P. DOS SANTOS, M.; CIOLDIN, F. H.; DINIZ, J. A.; DOI, I.; GODOY FILHO, J.; Junctionless fabricaqtion on SOI wafers using Focused Ion Beam milling and Al diffusion, 12/2012, ECS Transactions (Online), Vol. 49, pp.367-374, Philadelphia, PA, ESTADOS UNIDOS DA AMERICA, 2012
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BARROS, Angélica Denardi de; P.D. BATISTA, ; TAHRAOUI, A.; DINIZ, J. A.; SANTOS, P. V.; Ambipolar acoustic transport in silicon, 07/2012, Journal of Applied Physics, Vol. 112, Fac. 1, pp.1-1, New York, ESTADOS UNIDOS DA AMERICA, 2012
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LIMA, L. P. B.; DINIZ, J. A.; MIYOSHI, Juliana; SILVA, A. R.; GODOY FILHO, J.; RADTKE, Claudio; DOI, I.; Oxygen incorporation and dipole variation in tantalum nitride film used as metal-gate electrode, 07/2012, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures Processing, Measurement and Phenomena, Vol. 30, Fac. 4, pp.1-1, New York, ESTADOS UNIDOS DA AMERICA, 2012
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SOUZA, J. F.; MOREIRA, M. A.; DOI, I.; DINIZ, J. A.; TATSCH, Peter Jurgen; GONCALVES, Jose Lino; Preparation and characterization of high-k aluminium nitride (AlN) thin film for sensor and integrated circuits applications, 06/2012, Physica Status Solidi, Vol. 1, pp.1454-1457, Berlin, ALEMANHA, 2012
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DINIZ, J. A.; DOI, I.; Titanium Nitride as Promising Gate Electrode for MOS Technology, 06/2012, Physica Status Solidi. C: Current Topics in Solid State Physics, Vol. 9, Fac. 6, pp.1427-1430, Weinheim, ALEMANHA, 2012
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MIYOSHI, Juliana; LIMA, L. P. B.; DINIZ, J. A.; CAVARSAN, F. A.; GODOY FILHO, J.; RIBEIRO-SILVA, A; DOI, I.; TiN/titanium-aluminum oxynitride/ Si as new gate structure for 3D MOS technology, 04/2012, Microelectronic Engineering, Vol. 92, pp.140-144, Holanda, HOLANDA, 2012
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DINIZ, J. A.; DOI, I.; Titanium Nitride as Electrode for MOS Technology and Schottky Diode: Alternative Extraction Method of Titanium Nitride Work Function, 04/2012, Microelectronic Engineering, Vol. 92, pp.86-90, Holanda, HOLANDA, 2012
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MARCON, Rogerio; KAUFMANN, P.; FERNANDES, Luis; GODOY, R.; MARÚN, A.; BORTOLUCCI, Emilio Carlos; ZAKIA, M. B. P.; DINIZ, J. A.; KUDAKA SHOSEI, Amauri; Terahertz Photometer to Observe Solar Flares in Continuum, 02/2012, Journal of Microwaves, Optoelectronics and Electromagnetic Applications, Vol. 33, Fac. 2, pp.192-205, São Caetano do Sul, SP, BRASIL, 2012
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MEDEROS, Melissa; MUNOZ, S. N. M.; DOI, I.; DINIZ, J. A.; Influence of a Thickness and Percentage of Ge in Optical Properties of Thin Films of Si(1-x)Ge(x) Grown by LPCVD, 01/2012, ECS Transactions (Online), Vol. 49, pp.391-397, Philadelphia, PA, ESTADOS UNIDOS DA AMERICA, 2012
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MOREIRA, M. A.; DOI, I.; SOUZA, J. F.; DINIZ, J. A.; Electrical characterization and morphological properties of AlN films prepared by dc reactive magnetron sputtering, 05/2011, Microelectronic Engineering, Vol. 88, Fac. 5, pp.802-806, Holanda, HOLANDA, 2011
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LIMA, L. P. B.; DINIZ, J. A.; DOI, I.; GODOY FILHO, J.; Titanium nitride as electrode for MOS technology and Schottky diode: Alternative extraction method of titanium nitride work function, 05/2011, Microelectronic Engineering, Vol. 88, Fac. 8, pp.1659-2830, Holanda, HOLANDA, 2011
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KAUFMANN, P.; MARCON, R.; KUDAKA SHOSEI, Amauri; CASSIANO, M.M., ; FERNANDES, Luis; MARUM, A; PEREYRA, P.; GODOY, Roberto; BORTOLUCCI, Emilio Carlos; ZAKIA, M. B. P.; DINIZ, J. A.; SILVA, A. M.; Uncooled Detectors of Continnum Terahertz Radiation, 03/2011, Journal of Microwaves, Optoelectronics and Electromagnetic Applications, Vol. 10, pp.288-294, São Caetano do Sul, SP, BRASIL, 2011
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LIMA, L. P. B.; D. MOREIRA, Milena; CIOLDIN, F. H.; DINIZ, J. A.; DOI, I.; Tantalum Nitride as Promising Gate Electrode for MOS Technology, 09/2010, ECS Transactions (Online), Vol. 31, Fac. 1, pp.319-325, Philadelphia, PA, ESTADOS UNIDOS DA AMERICA, 2010
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BARROS, Angélica Denardi de; F. ALBERTIN, K.; MIYOSHI, Juliana; DOI, I.; DINIZ, J. A.; Thin titanium oxide films deposited by e-beam evaporation with additional rapid thermal oxidation and annealing for ISFET applications, 07/2010, Microelectronic Engineering, Vol. 87, pp.443-446, Holanda, HOLANDA, 2010
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GRADOS, H. R. Jimenez; MANERA, LEANDRO TIAGO; WADA, Ricardo; DINIZ, J. A.; DOI, I.; TATSCH, Peter Jurgen; HERNANDEZ FIGUEROA, Hugo Enrique; SWART, Jacobus Willibrordus; DC Improvements and Low-Frequency 1/ Noise Characteristics of Complimentary Metal Oxide Semiconductor Transistors with a Single n -Doped Polycrystalline Si/SiGe Gate Stack, 01/2010, Japanese Journal of Applied Physics, Vol. 49, pp.1-5, Toquio, JAPAO, 2010
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MIYOSHI, Juliana; DINIZ, J. A.; BARROS, Angélica Denardi de; DOI, I.; VON ZUBEN, A.A.G.; Titanium aluminum oxynitride (TAON) as high-k gate dielectric for sub-32nm CMOS technology, 01/2010, Microelectronic Engineering, Vol. 87, pp.267-270, Holanda, HOLANDA, 2010
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GRADOS, H. R. Jimenez; MANERA, LEANDRO TIAGO; F. RAUTEMBERG, M.; DINIZ, J. A.; DOI, I.; TATSCH, Peter Jurgen; HERNANDEZ-FIGUEROA, H. E.; SWART, Jacobus Willibrordus; The influence of poly-Si/SiGe gate in CMOS transistors for RF and microwave circuit applications, 01/2010, Physica Status Solidi. C: Current Topics in Solid State Physics, Vol. 7, Fac. 2, pp.440-443, Weinheim, ALEMANHA, 2010
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GRADOS, H. R. Jimenez; MANERA, LEANDRO TIAGO; FINARDI, M. R.; DINIZ, J. A.; DOI, I.; TATSCH, Peter Jurgen; HERNANDEZ FIGUEROA, Hugo Enrique; SWART, Jacobus Willibrordus; The Influence of Poly-Si/SiGe Gate in Thresshold, Sub-Threshould Parameters and Low Frequency Noise in p- MOSFETs, 08/2009, ECS Transactions (Online), Vol. 23, Fac. 1, pp.371-380, Philadelphia, PA, ESTADOS UNIDOS DA AMERICA, 2009
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KISNER, A; AGUIAR, M. R.; VAZ, A. F.; ROJAS, A.; CAVARSAN, F. A.; DINIZ, J. A.; KUBOTA, L.T.; Submicrometer-MOS capacitor with ultra high capacitance biased by Au nanoelectrodes, 03/2009, Applied Physics. A, Materials Science & Processing (Print), Vol. 94, Fac. 4, pp.831-836, Heidelberg, ALEMANHA, 2009
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ANJOS, Alexandre; DOI, I.; DINIZ, J. A.; Raman Characterization of SiGe Nanostructures Formed by Rapid Thermal Annealing, 01/2009, e-Journal of Surface Science and Nanotechnology, Vol. 7, pp.301-306, Tokyo, JAPAO, 2009
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BIASOTTO, C.; DINIZ, J. A.; M. DALTRINI, André; MOSHKALEV, Stanislav; MONTEIRO, M.J.R.; Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications, 09/2008, Thin Solid Films, Vol. 516, Fac. 21, pp.7777-7782, Lausanne, SUICA, 2008
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MIYOSHI, Juliana; WADA, Ricardo; BARROS, Angélica Denardi de; VON ZUBEN, A.A.G.; CAVARSAN, F. A.; DOI, I.; DINIZ, J. A.; High-k Gate-Dielectrics Based on Titanium-Aluminum for Sub-32 Nm CMOS Technology, 09/2008, ECS Transactions (Online), Vol. 14, Fac. 1, pp.295-302, Philadelphia, PA, ESTADOS UNIDOS DA AMERICA, 2008
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BARROS, Angélica Denardi de; MIYOSHI, Juliana; WADA, Ricardo; CAVARSAN, F. A.; DOI, I.; DINIZ, J. A.; Characteristics of Titanium Oxide Gate Nmosfet Formed by E-Beam Evaporation with Additional Rapid Thermal Oxidation and Annealing, 09/2008, ECS Transactions (Online), Vol. 14, Fac. 1, pp.327-333, Philadelphia, PA, ESTADOS UNIDOS DA AMERICA, 2008
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KISNER, A; AGUIAR, M. R., ; VAZ,, Vaz, Alfredo R.; ROJAS, A.; CAVARSAN, F. A.; DINIZ, J. A.; KUBOTA, L.T.; Submicrometer-MOS capacitor with ultra high capacitance biased by Au nanoelectrodes, 08/2008, Applied Physics. A, Materials Science & Processing (Print), Vol. 94, Fac. 4, pp.831-836, Heidelberg, ALEMANHA, 2008
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MANERA, LEANDRO TIAGO; B. ZOCCAL, Leonardo; DINIZ, J. A.; TATSCH, Peter Jurgen; DOI, I.; Surface passivation of InGaP/GaAs HBT using silicon-nitride film deposited by ECR-CVD plasma, 07/2008, Applied Surface Science, Vol. 254, Fac. 19, pp.6063-6066, Amsterdam, HOLANDA, 2008
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DOS ANJOS, A.P.; DOI, I.; DINIZ, J. A.; Structural characterization of SiGe nanocluters formed by rapid thermal annealing, 06/2008, Applied Surface Science, Vol. 254, pp.6055-6058, Amsterdam, HOLANDA, 2008
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DINIZ, J. A.; DOI, I.; TATSCH, Peter Jurgen; ZOCCAL, L. B.; Surface passivation of InGaP/GaAs HBT using silicon-nitride film deposited by ECR CVD plasma, 01/2008, Thin Solid Films, Vol. 516, Fac. 21, pp.7777-7782, Lausanne, SUICA, 2008
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BIASOTTO, Biasotto, C.; M. DALTRINI, André; C. TEIXEIRA, Ricardo; A. BOSCOLI, Fernando; DOI, I.; DINIZ, J. A.; MOSHKALEV, Stanislav; Deposition of sacrificial silicon oxide layers by electron cyclotron resonance plasma, 08/2007, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures Processing, Measurement and Phenomena, Vol. 25, pp.1166-1170, New York, ESTADOS UNIDOS DA AMERICA, 2007
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MSC. RICARDO COTRIN TEIXEIRA -, ; DOI, I.; SWART, Jacobus Willibrordus; DINIZ, J. A.; ZAKIA, M. B. P.; CV characteristics of polycrystalline SiGe Films with Low GE Concentration, 12/2006, Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms (Print), Vol. 253, Fac. 1-2, pp.37-40, Amsterdam, HOLANDA, 2006
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LEONARDO BRESEGHELLO ZOCCAL, ; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; M. DALTRINI, André; MOSHKALEV, Stanislav; The efficacy of ECR-CVD silicon nitride passivation in InGaP/GaAs HBTs, 01/2006, Journal of Vacuum Science and Technology. B: Microelectronics Processing and Phenomena, Vol. 1, Fac. 1, pp.1-3, New York, ESTADOS UNIDOS DA AMERICA, 2006
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DOI, I.; NELI, ROBERTO RIBEIRO; DINIZ, J. A.; SWART, Jacobus Willibrordus; Development of Process for Far Infrared Sensor Fabrication, 01/2006, Sensors and Actuators. A, Physical, Vol. 131, pp.400-406, Lausanne, SUICA, 2006
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DOI, I.; C. TEIXEIRA, Ricardo; SANTOS, R. E.; DINIZ, J. A.; SWART, Jacobus Willibrordus; G. DOS SANTOS FILHO, Sebastião; Thermal Stability of Ni(Pt) Silicide Films Formed on Poly-Si, 12/2005, Microelectronic Engineering, Vol. 82, pp.485-491, Holanda, HOLANDA, 2005
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C. TEIXEIRA, Ricardo; DOI, I.; ZAKIA, M. B. P.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Low Electrical Resistivity Polycrystalline SiGe Films Obtained by Vertical LPCVD for MOS Devices, 12/2005, Materials Science & Engineering. B, Solid-State Materials for Advanced Technology, Vol. 124, pp.138-142, Amsterdam, HOLANDA, 2005
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FELICIO, A. G.; DINIZ, J. A.; GODOY FILHO, J.; DOI, I.; PUDENZI, M.A.A.; SWART, Jacobus Willibrordus; The Effect of Nitrogen Concentration at Oxynitride Gate Insulators Formed by 28N2+ Implantation into Silicon with Additional Conventional or Rapid Thermal Oxidation, 07/2004, JICS. Journal of Integrated Circuits and Systems (Ed. Português), Vol. 1, Fac. 2, pp.41-47, Porto Alegre, RS, BRASIL, 2004
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C. TEIXEIRA, Ricardo; DOI, I.; ZAKIA, M. B. P.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Micro-Raman Stress Characterization of Polycrystalline Silicon Films Grown at High Temperature, 05/2004, Materials Science & Engineering. B, Solid-State Materials for Advanced Technology, Vol. 112, pp.160-164, Amsterdam, HOLANDA, 2004
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DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; Insulators Obtained by Electron Cyclotron Resonance Plasmas on Si or GaAs., 03/2003, Materials Characterization, Vol. 1, pp.135-147, Amsterdam, HOLANDA, 2003
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REYES-BETANZO, C.; MOSHKALEV, Stanislav; RAMOS, A. C. M.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Study of Conditions for Anisotropic Plasma Etching ofTtungsten and Tungsten Nitride Using SF6/Ar Gas Mixtures, 12/2002, Journal of the Electrochemical Society, Vol. 149, Fac. 3, pp.179-183, Manchester, NH 03108, ESTADOS UNIDOS DA AMERICA, 2002
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REYES-BETANZO, C.; MOSHKALEV, Stanislav; RAMOS, A. C. M.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Study of Conditions for Anisotropic Plasma Etching of Tungsten and Tungsten Nitride using SF6/Ar Gas Mixtures, 12/2002, Journal of the Electrochemical Society, Vol. 149, Fac. 3, pp.179-183, Manchester, NH 03108, ESTADOS UNIDOS DA AMERICA, 2002
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REYES-BETANZO, C.; MOSHKALEV, Stanislav; SARAGOSSA RAMOS, A.C.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Study of conditions for anisotropic plasma etching of tungsten and tungsten nitride using SF6/Ar gas mixtures, 08/2002, Journal of the Electrochemical Society, Vol. 149, Fac. [3], pp.179-183, Manchester, NH 03108, ESTADOS UNIDOS DA AMERICA, 2002
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DINIZ, J. A.; SOTERO F. MACEDO, Anna Paula; LUJAN, G.S.; TATSCH, Peter Jurgen; SWART, Jacobus Willibrordus; High quality ultra-thin oxynitride films formed by low-energy nitrogen implantaation into Silicon with additional plasma or thermal oxidation, 07/2000, Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms (Print), Vol. 166, pp.64-69, Amsterdam, HOLANDA, 2000
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SWART, Jacobus Willibrordus; DINIZ, J. A.; DOI, I.; BICA DE MORAES, M.A.; Modification of the refractive index and the dielectric constant of silicon dioxide by means of ion implantation, 03/2000, Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms (Print), Vol. 166, Fac. s/n, pp.171-176, Amsterdam, HOLANDA, 2000
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DINIZ, J. A.; SWART, Jacobus Willibrordus; JUNG, J.; HONG, J.; PEARTON, S.J.; Inductively coupled Plasma Etching of In-Based Compound Semiconductors in CH4/H2/Ar, 09/1998, Solid State Electronics, Vol. 42, Fac. 11, pp.1947-1951, Oxford, REINO UNIDO, 1998
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MOSHKALEV, Stanislav; DINIZ, J. A.; TATSCH, Peter Jurgen; MACHIDA, Munemasa; SWART, Jacobus Willibrordus; Deposition of Silicon by Low-Pressure electron cynclotron resonance plasma enhanced chemical vapor deposition in N2/Ar/SiH4, 12/1997, Journal of Vacuum Science and Technology, Vol. 15, Fac. 6, pp.2682-2687, New York, ESTADOS UNIDOS DA AMERICA, 1997
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DINIZ, J. A.; TATSCH, Peter Jurgen; PUDENZI, M.A.A.; Oxynitride films formed by low energy NO+ implantation into silicon, 08/1996, Applied Physics Letters, Vol. 69, Fac. 15, pp.2214-2215, College Park, ESTADOS UNIDOS DA AMERICA, 1996
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CÉSAR, R. R.; MARQUE, A. M. P.; DINIZ, J. A.; JOANNI, E; MEDEROS, Melissa; C. TEIXEIRA, Ricardo; Comparasion between TiO2 thin films deposited by DC and RF sputtering, 08/2019, Científico Internacional, 34th Symposium on Microelectronics Technology and Devices - SBMicro 2019, Vol., pp.1-4, São Paulo, SP, BRASIL, 2019
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STUCCHI-ZUCCHI, L.; SILVA, A. R.; DINIZ, J. A.; Junctionless-FET device fabrication using silicon etching in NH OH solution: device behaviour according to etching time, 08/2019, Científico Internacional, 34th Symposium on Microelectronics Technology and Devices - SBMicro 2019, pp.1-4, São Paulo, SP, BRASIL, 2019
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A. CIRINO, Giuseppe; BARÊA, L. A. M.; DOMINGOS MANSANO, Ronaldo; VERDONCK, Patrick Bernard; VON ZUBEN, A.A.G.; FRATESCHI, N.C.; DINIZ, J. A.; Comparative study between wet and dry etching of silicon for microchannels fabrication, 03/2019, Científico Internacional, SPIE OPTO 2019 - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics, Vol. 10930, pp.1-15, San Francisco, ESTADOS UNIDOS DA AMERICA, 2019
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CIOLDIN, F. H.; DINIZ, J. A.; VAZ, A.R.; A. CALLIGARIS, GUILHERME; L.P.CARDOSO, ; DOI, I.; Study of the phase transitions of Nickel Platinum Silicide obtained by sputtering and rapid thermal processing, 01/2017, Científico Internacional, 32nd Symposium on Microelectronics Technology and Devices - SBMicro 2017, pp.1-10, Fortaleza, CE, BRASIL, 2017
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CÉSAR, R. R.; BARROS, Angélica Denardi de; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Electrolyte-insulator-semiconductor structure (EIS) with TiO2 thin film for Pb detecting, 08/2016, Científico Internacional, 31st Symposium on Microelectronics Technology and Devices (SBMicro), pp.1-4, Belo Horizonte, MG, BRASIL, 2016
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LEONHARDT, A.; LIMA, L. P. B.; CIOLDIN, F. H.; SANTOS, M. V. P.; DINIZ, J. A.; MANERA, L. T.; FinFET prototypes fabricated by aluminium hard mask FIB milling for fin definition and SiON/TiN/Al gate stack, 08/2016, Científico Internacional, 31st Symposium on Microelectronics Technology and Devices (SBMicro), Vol., pp.1-4, Belo Horizonte, MG, BRASIL, 2016
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LEONHARDT, A.; CIOLDIN, F. H.; SANTOS, M. V. P.; LIMA, L. P. B.; DINIZ, J. A.; MANERA, L. T.; Ga+ Focused Ion Beam lithography as a Viable Alternative for Multiple fin FinFET Prototyping, 06/2016, Científico Internacional, The 60th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - EIPBN 2016, Vol., pp.1-4, Pittsburgh, PA, ESTADOS UNIDOS DA AMERICA, 2016
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SANTOS, M. V. P.; LIMA, L. P. B.; MAYER, R. A.; BETTINI, J.; BERON, F.; PIROTA, K. R.; DINIZ, J. A.; Electrical and structural characterization of electrodeposited Ni nanowires, 08/2015, Científico Internacional, 30th Symposium on Microelectronics Technology and Devices (SBMicro 2015)., Vol., pp.1-4, Salvador, BA, BRASIL, 2015
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ROSA, A. M.; DINIZ, J. A.; DOI, I.; CANESQUI, M. A.; SANTOS, M. V. P.; VAZ, Alfredo R.; Spacer lithography for 3D MOS devices using amorphous silicon deposited by ECR-CVD, 08/2015, Científico Internacional, 30th Symposium on Microelectronics Technology and Devices (SBMicro 2015)., pp.1-4, Salvador, BA, BRASIL, 2015
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LIMA, L. P. B.; SANTOS, M. V. P.; KEILER, M. A.; F. W. DEKKERS, H.; DE GENDT, S.; DINIZ, J. A.; N-Junctionless Transistor Prototype: Manufacturing Using a Focused Ion Beam System, 05/2015, Científico Internacional, 227th ECS Meeting, Vol. 66, pp.61-70, Chicago, IL, ESTADOS UNIDOS DA AMERICA, 2015
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MEDEROS, Melissa; MUNOZ, S. N. M.; DOI, I.; DINIZ, J. A.; Effect of annealing time on memory behavior of MOS structures based on Ge nanoparticles, 09/2014, Científico Internacional, 29th Symposium on Microelectronics Technology and Devices - SBMICRO 2014, Vol. 1, pp.1-5, Aracaju, SE, BRASIL, 2014
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CÉSAR, R. R.; BARROS, Angélica Denardi de; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Electrolyte-Insulator-Semiconductor field effect device for pH detecting, 09/2014, Científico Internacional, 29th Symposium on Microelectronics Technology and Devices - SBMICRO 2014, Vol. 1, pp.1-4, Aracaju, SE, BRASIL, 2014
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SANTOS, M. V. P.; NASCIMENTO JÚNIOR, A. R.; MANERA, L. T.; DINIZ, J. A.; SILVA, A. R.; SODRE, Arismar Cerqueira Jr; BARÊA, L. A. M.; FRATESCHI, N.C.; Silicon nitride for nonlinear optics applications in the telecommunications C-band deposited by ECR-CVD, 09/2014, Científico Internacional, 29th Symposium on Microelectronics Technology and Devices - SBMICRO 2014, Vol. 1, pp.1-4, Aracaju, SE, BRASIL, 2014
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BARROS, Angélica Denardi de; DOI, I.; SWART, Jacobus Willibrordus; DINIZ, J. A.; Thin titanium oxide films deposited by e-beam evaporation or by sputtering technique with additional rapid thermal oxidation, 09/2014, Científico Internacional, 29th Symposium on Microelectronics Technology and Devices - SBMICRO 2014, Vol. 1, pp.1-4, Aracaju, SE, BRASIL, 2014
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CÉSAR, R. R.; BARROS, Angélica Denardi de; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Thin titanium oxide films obtained by RTP and by sputtering, 09/2014, Científico Internacional, 29th Symposium on Microelectronics Technology and Devices - SBMICRO 2014, Vol. 1, pp.1-4, Aracaju, SE, BRASIL, 2014
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NELI, ROBERTO RIBEIRO; DOI, I.; DINIZ, J. A.; Characterization of fast-response and low-noise poly si uncooled far infrared sensor, 02/2014, Científico Internacional, IEEE Latin American Symposium on Circuits and Systems - LASCAS, Vol. 1, pp.1-4, Foz do Iguaçu, RS, BRASIL, 2014
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SODRÉ JUNIOR, A. C.; COSTA, I. F.; MANERA, L. T.; DINIZ, J. A.; Optically Controlled E-Antenna for Cognitive and Adaptive Radio over Fiber Systems, 11/2013, Científico Internacional, 2013 IFIP Wireless Days Conference, Vol. 1, pp.1-3, Valencia, ESPANHA, 2013
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CIOLDIN, F. H.; SANTOS, M. V. P.; DOI, I.; DINIZ, J. A.; FLACKER, A.; FINARDI, M. R.; TESCHKE, O.; BONUGLI, L.O.; A. ZAMBOTTI, Eduardo; GODOY FILHO, J.; Raman study of Nickel-Platinum Silicide formed by RTP process, 09/2013, Científico Internacional, 28th Symposium on Microelectronics Technology and Devices - SBMICRO 2013, Vol. 1, pp.1-4, Curitiba, PR, BRASIL, 2013
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MEDEROS, Melissa; MUNOZ, S. N. M.; DOI, I.; DINIZ, J. A.; Structural and electrical properties of Ge nanoparticles grown by LPCVD for MOSstructures, 09/2013, Científico Internacional, 28th Symposium on Microelectronics Technology and Devices - SBMICRO 2013, Vol. 1, pp.1-4, Curitiba, PR, BRASIL, 2013
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SOUZA, J. F.; B. LIMA, Michella; DOI, I.; TATSCH, Peter Jurgen; DINIZ, J. A.; GONCALVES, Jose Lino; SiNX/SiO2 STACKED SENSITIVE THIN FILM FOR ISFET-BASED CHEMICAL AND BIOCHEMICAL SENSORS - Preparation and Characterization of the Stacked Thin Films and Sensors, 02/2012, Científico Internacional, BIODEVICES 2012 - International Conference on Biomedical Electronics and Devices, Vol. 1, pp.302-306, Algarve, PORTUGAL, 2012
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LIMA, L. P. B.; DINIZ, J. A.; DOI, I.; MIYOSHI, Juliana; SILVA, A. R.; GODOY FILHO, J.; Tantalum Nitride as Electrode For MOS Tecnology and Schottky Diode, 09/2011, Científico Internacional, 26th Symposium on Microelectronics Technology and Devices - SBMicro 2011, Vol. 1, pp.69-75, João Pessoa, PB, BRASIL, 2011
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KAUFMANN, P.; MARCON, Rogerio; MARÚN, A.; KUDAKA SHOSEI, Amauri; BORTOLUCCI, Emilio Carlos; ZAKIA, M. B. P.; DINIZ, J. A.; CASSIANO, M.M., ; P. PEREYRA, ; FERNANDES, Luis; Selective Spectral Detection of Continuum Terahertz Radiation, 09/2010, Científico Internacional, 7741 spie 2010, Vol. 7741, pp.1-10, San Diego, ESTADOS UNIDOS DA AMERICA, 2010
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SOUZA, J. F.; DINIZ, J. A.; TATSCH, Peter Jurgen; Array of Ion-sensitive fieldeffect transistors based pH sensors using SiNx/SiOxNy Stacked Layer Gate Dielectric, 09/2009, Científico Internacional, 11th International Conference on Advaced Materials - ICAM 2009, Vol. 1, pp.1-3, Rio de Janeiro, RJ, BRASIL, 2009
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FURTADO, A. S. O.; DINIZ, J. A.; W. DE LIMA MONTEIRO, D.; Fabrication and Characterization of Active Pixel Sensors (APS) Using Simple Metal Gate nMOS Technology, 09/2009, Científico Internacional, 24th Symposium on Microelectronics Technology and Devices - SBMicro 2009, Vol. 1, pp.1-7, Natal, RN, BRASIL, 2009
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BARROS, Angélica Denardi de; MIYOSHI, Juliana; F. ALBERTIN, K.; DINIZ, J. A.; Titanium oxide films as sensitive membrane in field effect devices, 09/2009, Científico Internacional, 11th International Conference on Advaced Materials - ICAM 2009, Vol. 1, pp.1-3, Rio de Janeiro, RJ, BRASIL, 2009
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GRADOS, H. R. Jimenez; MANERA, LEANDRO TIAGO; F. RAUTEMBERG, M.; DINIZ, J. A.; DOI, I.; TATSCH, Peter Jurgen; HERNANDEZ FIGUEROA, Hugo Enrique; SWART, Jacobus Willibrordus; The influence of Poly-Si/SiGe gate in threshold, sub-threshold parameters and low frequency noise in p-MOSFETs, 06/2009, Científico Internacional, 24th Symposium on Microelectronics Technology and Devices - SBMicro 2009, Vol. 23, pp.1-10, Natal, RN, BRASIL, 2009
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GRADOS, H. R. Jimenez; MANERA, LEANDRO TIAGO; F. RAUTEMBERG, M.; DINIZ, J. A.; DOI, I.; TATSCH, Peter Jurgen; HERNANDEZ FIGUEROA, Hugo Enrique; SWART, Jacobus Willibrordus; The influence of Poly-Si/SiGe gate in CMOS transistors for RF and microwave circuit applications, 05/2009, Científico Internacional, 12th International Conference on the Formation of Semiconductor Interfaces - ICFSI 2009, Vol. 1, pp.1-3, Weimar, ALEMANHA, 2009
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MOSHKALEV, Stanislav; SWART, Jacobus Willibrordus; DINIZ, J. A.; ZOCCAL, LEONARDO BRESEGHELLO; VAZ, A. R.; YAMAMOTO, S. D.; Adjustment of Microwave Integrated Circuit (MIC) with Focused Ion Beam., 12/2008, Científico Internacional, International Symposium on Microelectronics Technology and Devices (SBMicro), Vol. 14, pp.131-136, Gramado, RS, BRASIL, 2008
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GRADOS, H. R. Jimenez; MANERA, LEANDRO TIAGO; C. TEIXEIRA, R.; F. RAUTEMBERG, M.; DINIZ, J. A.; DOI, I.; TATSCH, Peter Jurgen; HERNANDEZ FIGUEROA, Hugo Enrique; SWART, Jacobus Willibrordus; DC Performance and Low Frequency Noise in n-MOSFETs using Self-Aligned Poly-Si/SiGe Gate, 09/2008, Científico Internacional, International Symposium on Microelectronics Technology and Devices (SBMicro), Vol. 14, pp.137-146, Gramado, RS, BRASIL, 2008
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FELIPE LORENZO DELLA LUCIA - I, ; SWART, Jacobus Willibrordus; ZOCCAL, LEONARDO BRESEGHELLO; DINIZ, J. A.; DOI, I.; FRATESCHI, N.C.; Simulation and Fabrication of Suspended-Membrane Resistive Microbolometers Using Gold-Black as Absorber, 09/2008, Científico Internacional, International Symposium on Microelectronics Technology and Devices (SBMicro), Vol. 14, pp.93-98, Gramado, RS, BRASIL, 2008
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ELEOTÉRIO, M. A. S.; DOI, I.; CADILLO, R. F.; DINIZ, J. A.; G. DOS SANTOS FILHO, Sebastião; Post-Silicidation Annealiing Effects on Electrical and Structural Properties of NiPt Germanosilicide, 09/2008, Científico Internacional, 23rd Symposium on Microelectronics Techonology and Devices, SBMicro 2008, Vol. 14, pp.385-393, Gramado, RS, BRASIL, 2008
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SCALISE, H. M.; DOI, I.; DINIZ, J. A.; Bird's Beak and Thermally Induced Stress Defects Evaluations of LOCOS Structures Fabricated Using ECR-CVD SiNx Without Pad Oxide, 09/2008, Científico Internacional, 23rd Symposium on Microelectronics Techonology and Devices, SBMicro 2008, Vol. 14, pp.395-402, Gramado, RS, BRASIL, 2008
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SWART, Jacobus Willibrordus; ZOCCAL, LEONARDO BRESEGHELLO; DINIZ, J. A.; GODOY FILHO, J.; DALTRINI, A.M.; ECR-CVD SiNx Passivation in GaAs-Based MISFET Devices., 12/2007, Científico Internacional, 22nd Symposium on Microelectronics Technology and Devices - SBMicro 2007, Vol. 9, pp.159-168, Rio de Janeiro, RJ, BRASIL, 2007
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DOS ANJOS, A.P.; DINIZ, J. A.; ZOCCAL, LEONARDO BRESEGHELLO; MENGUI, U. A.; CANESQUI, M. A.; DOI, I.; Clusters Formation by Rapid Thermal Annealing on SiO2/Ge and SiH/Ge Heterostructures, 01/2007, Científico Internacional, 22nd Symposium on Microelectronics Technology and Devices - SBMicro2007, Vol. 9, pp.269-277, Rio de Janeiro, RJ, BRASIL, 2007
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SWART, Jacobus Willibrordus; DOI, I.; DINIZ, J. A.; ZAKIA, M. B. P.; Morphological study of polycrystalline SiGe alloy deposited by vertical LPCVD, 06/2006, Científico Internacional, Coherent Optical Technologies and Applications (COTA) Topical Meeting, Vol. 36(2A), pp.466-469, Whistler, British Columbia, Canadá, CANADA, 2006
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OLIVEIRA JÚNIOR, A. C.; DOI, I.; DINIZ, J. A.; A Comparative Analysis of Electrical Characteristics of Silicon Micro-Heaters for Thermal Transducers Applications, 09/2005, Científico Internacional, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, Vol. 1, pp.363-371, Florianópolis, SC, BRASIL, 2005
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MUNOZ, S. N. M.; RODRIGUES, E.; GRADOS, H. R. Jimenez; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; Characterization and Performance Evaluation of an APS Pixel in a Standard 2 um CMOS Technology, 09/2005, Científico Internacional, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, Vol. 1, pp.32-38, Florianópolis, SC, BRASIL, 2005
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C. TEIXEIRA, Ricardo; DOI, I.; ZAKIA, M. B. P.; DINIZ, J. A.; Morphological and Electrical Study of Poly-SiGe Alloy Deposited by Vertical LPCVD, 09/2005, Científico Internacional, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, Vol. 1, pp.188-196, Florianópolis, SC, BRASIL, 2005
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DINIZ, J. A.; DOI, I.; NELI, ROBERTO RIBEIRO; Process Optimization for Microbolometers Fabrication, 09/2005, Científico Internacional, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, Vol. 1, pp.357-362, Florianópolis, SC, BRASIL, 2005
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BIASOTTO, C.; BOSCOLI, F. A.; C. TEIXEIRA, Ricardo; RAMOS, A.C.S.; DINIZ, J. A.; DALTRINI, A.M.; MOSHKALEV, Stanislav; DOI, I.; Silicon Oxide Sacrificial Layer dor MEMS Applications, 09/2005, Científico Internacional, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, Vol. 1, pp.389-397, Florianópolis, SC, BRASIL, 2005
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SANTOS, R. E.; DOI, I.; HAYASHI, M.A.; DINIZ, J. A.; G. DOS SANTOS FILHO, Sebastião; Thermal Stability of Ni/Pt Silicide Films on BF Doped and Undoped (100)Si, 09/2005, Científico Internacional, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, Vol. 1, pp.197-203, Florianópolis, SC, BRASIL, 2005
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SANTOS, Regis; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; "Thermal stability of Ni/Pt Siliciude Films on BF Doped and Undoped (100) Si", 09/2005, Científico Internacional, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, Vol. 2005-8, pp.197-203, Florianópolis, SC, BRASIL, 2005
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BIASOTTO, C.; BOSCOLI, F. A.; C. TEIXEIRA, Ricardo; RAMOS, A.C.S.; DINIZ, J. A.; M. DALTRINI, André; MOSHKALEV, Stanislav; DOI, I.; Silicon Oxide Sacrificial Layer for MEMS Applications., 01/2005, Científico Internacional, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, Vol. 2005-8, pp.389-397, Florianópolis, SC, BRASIL, 2005
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GRADOS, H. R. Jimenez; MANERA, LEANDRO TIAGO; DINIZ, J. A.; TATSCH, Peter Jurgen; CAMOLESI, A.; FRUETT, Fabiano; A CMOS Technology for Educational Activities and Academic Projects, 01/2005, Científico Internacional, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, Vol. 1, pp.1-3, Florianópolis, SC, BRASIL, 2005
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MUNOZ, S. N. M.; RODRIGUEZ, E.M.; GRADOS, H. R. Jimenez; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; Characterization and performance evaluation of a APS pixel in a standard 2 m CMOS Technology., 01/2005, Científico Internacional, 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, Vol. 2005-8, pp.1-3, Florianópolis, SC, BRASIL, 2005
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GRADOS, H. R. Jimenez; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; Development of a 2 m twin-well CMOS Process for academic application. In: Workshop on Semiconductors and Micro & Nano Technology, 01/2005, Científico Internacional, Workshop on Semiconductors and Micro & Nano-Technology - SEMINATEC 2005, Vol. 1, pp.72-74, CAMPINAS, SP, BRASIL, 2005
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MOSHKALEV, Stanislav; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; ZOCCAL, LEONARDO BRESEGHELLO; M. DALTRINI, André; The Efficacy of ECR-CVD Silicon Nitride Passivation in InGaP/GaAs HBTs., 01/2005, Científico Internacional, 27th International Symposium on Dry Process, Vol. 1, pp.1-3, Jeju City, COREIA DO SUL, 2005
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M. DALTRINI, André; MOSHKALEV, Stanislav; MONTEIRO, M.J.R.; MACHIDA, Munemasa; KOSTRYUKOV, A.; BESSELER, E.; BIASOTTO, C.; DINIZ, J. A.; Plasma Diagnostics in High Density Reactors., 01/2005, Científico Internacional, XI Latin American Workshop on Plasma Physics, Vol. 1, pp.1-3, Cidade do México, MEXICO, 2005
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M. DALTRINI, André; MOSHKALEV, Stanislav; MONTEIRO, M.J.R.; KOSTRYUKOV, A.; BESSELER, E.; BIASOTTO, C.; DINIZ, J. A.; MACHIDA, Munemasa; Plasma Reactors for Material Processing at CCS-UNICAMP, 01/2005, Científico Internacional, 8th Brazilian Meeting on Plasma Physics, Vol. 1, pp.22-25, Niterói, RJ, BRASIL, 2005
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BIASOTTO, C.; BOSCOLI, F. A.; C. TEIXEIRA, Ricardo; DINIZ, J. A.; M. DALTRINI, André; MOSHKALEV, Stanislav; DOI, I.; Silicon Oxide Deposition by ECR Plasma for MEMS Applications., 01/2005, Científico Internacional, DPS 2005 - 5th International Symposium on Dry Process, Vol. 1, pp.383-386, Jeju, COREIA DO SUL, 2005
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BIASOTTO, C.; DINIZ, J. A.; M. DALTRINI, André; MOSHKALEV, Stanislav; RAMOS, A.C.S.; SWART, Jacobus Willibrordus; Suspended Silicon Oxynitride Structures Fabricated by ECR Plasma and Wet Etching., 01/2005, Científico Internacional, DPS 2005 - 5th International Symposium on Dry Process, Vol. 1, pp.387-390, Jeju, COREIA DO SUL, 2005
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MUNOZ, S. N. M.; GRADOS, H. R. Jimenez; FERREIRA DA SILVA, Isaias; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; High Performance Active Pixel Sensors Fabricated in a Standard 2.0 um CMOS Technology, 11/2004, Científico Internacional, IEEE International Caracas Conference on Devices, Circuits and Systems, Vol. 1, pp.276-280, Punta Cana, REPUBLICA DOMINICANA, 2004
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C. TEIXEIRA, Ricardo; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; ZAKIA, M. B. P.; G. DOS SANTOS FILHO, Sebastião; Characteristics of Polycristalline Si1-XGeX Alloy Deposited in a Vertical LPCVD System, 09/2004, Científico Internacional, 19th Symposium on Microelectronics Technology and Devices - SBMICRO 2004, Vol. 2004-3, pp.307-312, Porto de Galinhas, PE, BRASIL, 2004
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G. DOS SANTOS FILHO, Sebastião; DINIZ, J. A.; SWART, Jacobus Willibrordus; Electrical Characterization of Thin Gate Oxynitride Obtianed By N+ Implantation into Polysilicon/Thermal Oxide/Silicon Structure, 09/2004, Científico Internacional, 19th Symposium on Microelectronics Technology and Devices - SBMICRO 2004, Vol. 200403, pp.331-336, Porto de Galinhas, PE, BRASIL, 2004
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SANTOS, R. E.; DOI, I.; C. TEIXEIRA, Ricardo; DINIZ, J. A.; SWART, Jacobus Willibrordus; G. DOS SANTOS FILHO, Sebastião; Formation and Stability of Ni(Pt)Si/Poly-Si Layered Structure, 09/2004, Científico Internacional, 19th Symposium on Microelectronics Technology and Devices - SBMICRO 2004, Vol. 2004-3, pp.259-264, Porto de Galinhas, PE, BRASIL, 2004
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MUNOZ, S. N. M.; BIASOTTO, C.; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; High Sensitivity Obtained by Three-Color Detector APS-CMOS Using Antireflective Coating, 09/2004, Científico Internacional, 19th Symposium on Microelectronics Technology and Devices - SBMICRO 2004, Vol. 200403, pp.201-206, Porto de Galinhas, PE, BRASIL, 2004
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VIEIRA, R.; MARTARELLO, VALTER; MOSHKALEV, Stanislav; DINIZ, J. A.; SWART, Jacobus Willibrordus; Selective Etching of Polycristalline Sillicon in a Hexode Type Plasma Etcher, 09/2004, Científico Internacional, 19th Symposium on Microelectronics Technology and Devices - SBMICRO 2004, Vol. 200403, pp.363-368, Porto de Galinhas, PE, BRASIL, 2004
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MANÊRA, G. A.; DINIZ, J. A.; MOSHKALEV, Stanislav; DOI, I.; SWART, Jacobus Willibrordus; Silicon Oxyntride Gate-Dielectric Made by ECR Plasma Oxynitridation, 09/2004, Científico Internacional, 19th Symposium on Microelectronics Technology and Devices - SBMICRO 2004, Vol. 200403, pp.253-258, Porto de Galinhas, PE, BRASIL, 2004
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SCORALICK JUNIOR, C.; DOI, I.; C. TEIXEIRA, Ricardo; DINIZ, J. A.; SWART, Jacobus Willibrordus; Stress Analysis of Vertical LPCVD Thick Poly-Si by Micro-Raman Spectroscopy for MEMS Applications, 09/2004, Científico Internacional, 19th Symposium on Microelectronics Technology and Devices - SBMICRO 2004, Vol. 200403, pp.113-119, Porto de Galinhas, PE, BRASIL, 2004
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BIASOTTO, C.; MONTE, B.; NELI, ROBERTO RIBEIRO; RAMOS, A. C. M.; DINIZ, J. A.; MOSHKALEV, Stanislav; DOI, I.; SWART, Jacobus Willibrordus; Suspended Membranes made by Silicon Nitride Deposited by EDR-CVD, 09/2004, Científico Internacional, 19th Symposium on Microelectronics Technology and Devices - SBMICRO 2004, Vol. 200403, pp.119-123, Porto de Galinhas, PE, BRASIL, 2004
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NELI, ROBERTO RIBEIRO; DOI, I.; MELO, A. M.; ARBEX, C. J. N.; ZAKIA, M. B. P.; KAUFMANN, P.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Uncooled Thermal Infrared Detector for Detection of far-infrared radiation, 09/2004, Científico Internacional, 19th Symposium on Microelectronics Technology and Devices - SBMICRO 2004, Vol. 200403, pp.95-100, Porto de Galinhas, PE, BRASIL, 2004
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FIORAVANTE JUNIOR, N. P.; MANERA, LEANDRO TIAGO; MOSHKALEV, Stanislav; DINIZ, J. A.; TATSCH, Peter Jurgen; GRADOS, H. R. Jimenez; SWART, Jacobus Willibrordus; Precise Control on Micron and Submicron Feature Dimensions in Photolithography for MOS and MEMS Applications, 09/2004, Científico Internacional, 19th Symposium on Microelectronics Technology and Devices - SBMICRO 2004, Vol. 3, pp.369-374, Porto de Galinhas, PE, BRASIL, 2004
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MAMEDE, G. L.; OLIVEIRA JÚNIOR, A. C.; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Conditioning and Interface Circuits for Thermo-Resistive Temperature Microsensor with Digital Output, 09/2004, Científico Internacional, Student Forum on Microelectronics 2004 - SBFORUM 2004, Vol. 1, pp.1-3, Porto de Galinhas, PE, BRASIL, 2004
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MANÊRA, G. A.; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; Ultra-thin Silicon Oxynitride Gate-Dielectric made by ECR Plasmas, 04/2004, Científico Internacional, ELECTROCHEMICAL SOCIETY PROCEEDINGS, Vol. 2004-1, pp.216-221, TEXAS, ESTADOS UNIDOS DA AMERICA, 2004
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FELICIO, A. G.; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; The effect of nitrogen concentration at silicon oxynitride gate insulators formed by 28N2+ implantation into silicon with additional conventional or rapid thermal oxidation, 09/2003, Científico Internacional, 18th International Symposium on Microelectronics Technology and Devices - SBMicro 2003, Vol. 2003-9, pp.250-258, São Paulo, SP, BRASIL, 2003
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OLIVEIRA JÚNIOR, A. C.; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; W. SIMÕES, E.; Modeling and Simulation of Static Characteristics of a PMOS Compatible Hot Wire Principle-Based Flow Micro-Sensor, 09/2003, Científico Internacional, 18th International Symposium on Microelectronics Technology and Devices - SBMicro 2003, Vol. 2003-9, pp.437-444, São Paulo, SP, BRASIL, 2003
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NELI, ROBERTO RIBEIRO; DOI, I.; RIBAS, R.P.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Orientation-Dependent Anisotropic Etching Simulation in Silicon Wafer, 09/2003, Científico Internacional, 18th International Symposium on Microelectronics Technology and Devices - SBMicro 2003, Vol. 2003-9, pp.389-397, São Paulo, SP, BRASIL, 2003
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DINIZ, J. A.; SWART, Jacobus Willibrordus; Photodiode - type Pixels for APS-CMOS 2um Image Sensors, 09/2003, Científico Internacional, IX IBERCHIP WORKSHOP IWS-2003, Vol. 1, pp.5-7, HAVANA, ESTADOS UNIDOS DA AMERICA, 2003
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DINIZ, J. A.; PUDENZI, M.A.A.; SWART, Jacobus Willibrordus; "The effect of Nitrogen Concentration at Silicon Oxynitride Gate Insulators Formed by 28N2+ Implantation into Silicon with Additional Conventional or Rapid Thermal Oxidation", 09/2003, Científico Internacional, 18th International Symposium on Microelectronics Technology and Devices - SBMicro 2003, Vol. 09, pp.250-257, São Paulo, SP, BRASIL, 2003
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DINIZ, J. A.; SWART, Jacobus Willibrordus; SOUZA, P. R.; A Comparative Study of Aluminum and Tungsten Silicon Schottky Diodes, 08/2003, Científico Internacional, 18th International Symposium on Microelectronics Technology and Devices - SBMicro 2003, Vol. 2003, pp.166-172, São Paulo, SP, BRASIL, 2003
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SANTOS, R. E.; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; G. DOS SANTOS FILHO, Sebastião; Formation and Characterization of the Ni(Pt)Si and NiSi for MOS Devices Applications, 09/2002, Científico Internacional, SBMICRO 2002 - XVII Symposium on Microelectronics Technology and Devices, Vol. 1, pp.109-116, Porto Alegre, RS, BRASIL, 2002
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NELI, ROBERTO RIBEIRO; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Wet Anisotropic Etching Characterization of Crystalline Silicon for Suspended Micro-Mechanical Structure Manufacture, 09/2002, Científico Internacional, SBMICRO 2002 - XVII Symposium on Microelectronics Technology and Devices, Vol. 1, pp.157-166, Porto Alegre, RS, BRASIL, 2002
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GRADOS, H. R. Jimenez; MUNOZ, S. N. M.; PAVANELLO, M. A.; FERREIRA DA SILVA, Isaias; DINIZ, J. A.; ZAKIA, M. B. P.; DOI, I.; SWART, Jacobus Willibrordus; Development of CMOS-APS Technology, 09/2002, Científico Internacional, SBMICRO 2002 - XVII Symposium on Microelectronics Technology and Devices, Vol. 1, pp.223-229, Porto Alegre, RS, BRASIL, 2002
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PEREIRA, M.A.; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; Locos Isolation Made by Silicon Nitride ECR Plasma Deposition at Room-Temperature, 09/2002, Científico Internacional, SBMICRO 2002 - XVII Symposium on Microelectronics Technology and Devices, Vol. 1, pp.373-380, Porto Alegre, RS, BRASIL, 2002
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MOSHKALEV, Stanislav; REYES BETANZO, C.; C. TEIXEIRA, Ricardo; DOI, I.; ZAKIA, M. B. P.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Etching of Polycrystalline Silicon in SF6 Containing Plasmas, 09/2001, Científico Internacional, SBMICRO 2001 - XVI International Conference on Microelectronics and Packaging, Vol. 1, pp.208-211, Pirenópolis, GO, BRASIL, 2001
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C. TEIXEIRA, Ricardo; DOI, I.; ZAKIA, M. B. P.; SWART, Jacobus Willibrordus; DINIZ, J. A.; Grain Size Influence on Sheet Resistance of P- and As-Implanted Polycrystalline Silicon Deposited by Vertical CVD Reactor, 09/2001, Científico Internacional, SBMICRO 2001 - XVI International Conference on Microelectronics and Packaging, Vol. 1, pp.215-218, Pirenópolis, GO, BRASIL, 2001
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GRADOS, H. R. Jimenez; SWART, Jacobus Willibrordus; DOI, I.; DINIZ, J. A.; Project and Development of an Educational CMOS Process, 09/2001, Científico Internacional, SBMICRO 2001 - XVI International Conference on Microelectronics and Packaging, Vol. 1, pp.260-263, Pirenópolis, GO, BRASIL, 2001
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DINIZ, J. A.; GODOY FILHO, J.; DOI, I.; SWART, Jacobus Willibrordus; Proton Radiation Hardening of Ultra-thin Silicon Oxynitride Gate nMOSFETs formed by low-energy Nitrogen Implantation Into Silicon With Additional Conventional or Rapid Thermal Oxidation, 09/2001, Científico Internacional, MRS INTERNATIONAL WORKSHOP ON DEVICES TECHNOLOGY - Alternatives to SiO2 as Gate Dielectric for Future Si-Based Microelectronics, Vol. 1, pp.45-45, Porto Alegre, RS, BRASIL, 2001
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SWART, Jacobus Willibrordus; DINIZ, J. A.; QUEIRÓZ, J. E. C.; HAYASHI, M.A.; Shallow Junction Formation with Preamorphization and Rapid Thermal Annealing of Boron Implanted Silicon, 09/2001, Científico Internacional, SBMICRO 2001 - XVI International Conference on Microelectronics and Packaging, Vol. 1, pp.197-199, Pirenópolis, GO, BRASIL, 2001
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SWART, Jacobus Willibrordus; MANERA, LEANDRO TIAGO; DINIZ, J. A.; TATSCH, Peter Jurgen; An E/D nMOS Technology for Educational and Multi-project Chip Activities, 09/2001, Científico Internacional, SBMICRO 2001 - XVI International Conference on Microelectronics and Packaging, Vol. 1, pp.264-267, Pirenópolis, GO, BRASIL, 2001
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SWART, Jacobus Willibrordus; DINIZ, J. A.; GODOY, J.; DOI, I.; Proton Radiation Hardening of Ultra-Thin Silicon Oxynitride Gate Insulator Formed by Nitrogen Implantation into Silicon with Additional Conventional or Rapid Thermal Oxidation, 09/2001, Científico Internacional, MRS International Workshop on Device Technology, Vol. 1, pp.1-1, Porto Alegre, RS, BRASIL, 2001
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SWART, Jacobus Willibrordus; SOTERO, A. P.; DINIZ, J. A.; TATSCH, Peter Jurgen; Interface Nitride Layer INcorporation During Remote Plasma Oxynitridation of Si in N2O and N2O/N2, 09/2001, Científico Internacional, MRS International Workshop on Device Technology, Vol. 1, pp.1-1, Porto Alegre, RS, BRASIL, 2001
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DINIZ, J. A.; GODOY FILHO, J.; ZAKIA, M. B. P.; DOI, I.; SWART, Jacobus Willibrordus; Proton Radiation Hardening of Silicon Oxynitride Gate nMOSFETs Formed by Nitrogen Implantation into Silicon Prior to Oxidation, 09/2001, Científico Internacional, RADECS2001 - 6th European Conference on Radiation and its Effects on Components and Systems, Vol. 1, pp.1-5, Grenoble, FRANCA, 2001
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VAN NOIJE, W.A.M.; SWART, Jacobus Willibrordus; VERDONCK, P.; DINIZ, J. A.; DOI, I.; ZAKIA, M. B. P.; MANZANO, R.D.; Initiatives for Promotion of Microelectronics and Microfabrication at São Paulo State Universities - Brazil, 06/2001, Científico Internacional, Fourteenth Biennial University/Government/Industry Microelectronics Symposium, Vol. 1, pp.16-19, Richmond - Virginia, ESTADOS UNIDOS DA AMERICA, 2001
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DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; Characteristics of Silicon Oxynitrides Made by ECR Plasmas, 03/2001, Científico Internacional, Sixth International Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films, Vol. 1, pp.156-162, Washington, ESTADOS UNIDOS DA AMERICA, 2001
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DINIZ, J. A.; GODOY FILHO, J.; DOI, I.; SWART, Jacobus Willibrordus; Radiation Hardening of Oxynitrides Formed by Low Energy Nitrogen Implantation Into Silicon Prior to Oxidation, 03/2001, Científico Internacional, Sixth International Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films, Vol. 1, pp.163-171, Washington, ESTADOS UNIDOS DA AMERICA, 2001
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DINIZ, J. A.; GODOY, J.Fo.; SWART, Jacobus Willibrordus; Electrical Characteristics of Ultra-Thin silicon Oxynitride Gate NMOSFET Formed by Low-Energy Nitrogen Implantation into Silicon with Additional convenctional or Rapid Thermal Oxidation, 09/2000, Científico Internacional, xv SBMicro, Vol. 1, pp.114-118, Manaus, AM, BRASIL, 2000
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MOSHKALEV, Stanislav; REYES BETANZO, C.; SARAGOSSA RAMOS, A.C.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Comparative Study of Reactive Ion Etching of W, WNx and Si in SF/Ar Using Optical Emission Spectroscopy, 09/2000, Científico Internacional, SBMICRO 2000, Vol. 1, pp.319-321, Manaus, AM, BRASIL, 2000
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DINIZ, J. A.; BARROS JR., Luiz Eugenio M. de; YOSHIOKA, R.T.; LUJAN, G.S.; DANILOV, Iouri; SWART, Jacobus Willibrordus; One-step Silicon Nitride Passivation by ECR-CVD for Heterostructure Transistors and MIS Devices, 10/1999, Científico Internacional, MRS 1999 Spring Meeting, Vol. 573, pp.5-8, San Francisco, ESTADOS UNIDOS DA AMERICA, 1999
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SARAGOSSA RAMOS, A.C.; DINIZ, J. A.; TATSCH, Peter Jurgen; SWART, Jacobus Willibrordus; ECR etchnig of III-V compound semiconductors in BCl3/Ar at low BCl3 flows., 08/1999, Científico Internacional, ICMP 99, Vol. 1, pp.29-32, Campinas, SP, BRASIL, 1999
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LUJAN, G.S.; DINIZ, J. A.; TATSCH, Peter Jurgen; SWART, Jacobus Willibrordus; ECR Plasma Surface Passivation for Enhanced Thermal Stability of WNx/GaAs Schottky Contacts, 08/1999, Científico Internacional, ICMP 99, Vol. 1, pp.292-294, Campinas, SP, BRASIL, 1999
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PEREIRA, José Luiz; DOI, I.; DINIZ, J. A.; DANIEL, G.B.; A New Education Program on Microfabrication at UNICAMP, 07/1999, Científico Internacional, ICMP 99, Vol. 1, pp.312-315, Campinas, SP, BRASIL, 1999
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SWART, Jacobus Willibrordus; DOI, I.; DINIZ, J. A.; DANIEL, Gustavo B.; A New Education Program on Microfabrication at UNICAMP, 08/1999, Científico Internacional, International Conference on Microelectronics and Packaging-ICMP'99, Vol. 1, pp.312-315, CAMPINAS, SP, BRASIL, 1999
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SWART, Jacobus Willibrordus; DOI, I.; DINIZ, J. A.; DANIEL, Gustavo B.; Hands-on Education Program on Microfabrication at UNICAMP, 08/1999, Científico Internacional, International Conf. on Engineering and Computer Education - ICECE'99, Vol. 1, pp.325-329, Rio de Janeiro, RJ, BRASIL, 1999
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SWART, Jacobus Willibrordus; SARAGOSSA RAMOS, A.C.; DINIZ, J. A.; TATSCH, Peter Jurgen; ECR Etching of III-V Compound semiconductors in BCI3/Ar aat Low BCI3 Flows, 08/1999, Científico Internacional, XIV SBMicro - International conference on Microelectronics and Packaging ICMP'99, Vol. 1, pp.29-32, SP, BRASIL, 1999
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SWART, Jacobus Willibrordus; DINIZ, J. A.; COUTO, A.L.; DANILOV, I.; TATSCH, Peter Jurgen; Silicon oxynitride Deposited by N2/)2/Ar/SiH4 ECR-CVD or Grown by N2/O2/Ar ECR Plasma Oxidation on Si substrates for MOS Devices, 08/1999, Científico Internacional, ICMP'99, Vol. 1, pp.164-167, SP, BRASIL, 1999
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SWART, Jacobus Willibrordus; SOTERO, A. P.; DINIZ, J. A.; TATSCH, Peter Jurgen; Silicon Oxide Grown by Microwave Plasma Oxidation on SI substrates for MOS Devices, 08/1999, Científico Internacional, ICMP'99, Vol. 1, pp.160-163, SP, BRASIL, 1999
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DINIZ, J. A.; COUTO, A.L.; DANILOV, Iouri; TATSCH, Peter Jurgen; SWART, Jacobus Willibrordus; Silicon Oxynitride Deposited by N2/O2/Ar/SiH4 ECR-CVD Plasma or Grown by N2/Os/Ar ECR Plasma Oxidation on Si Substrates for MOS Devices, 07/1999, Científico Internacional, ICMP 99, Vol. s/n, pp.164-167, Campinas, SP, BRASIL, 1999
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SWART, Jacobus Willibrordus; DINIZ, J. A.; DOI, I.; BICA DE MORAES, M.A.; Modification of the refractive index and the dieletric constant of the silicon dioxide by means of ion implantation, 06/1999, Científico Internacional, 10th International Conf. on Radiation Effects in Insulators, Vol. S/N, pp.171-176, Jena, ALEMANHA, 1999
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DINIZ, J. A.; SANSIGOLO LUJAN, Alexandre; TATSCH, Peter Jurgen; SWART, Jacobus Willibrordus; Silicon Nitride Deposited by ECR-CVD on GaAs Substrates for Surface Passivation and MIS Devices, 07/1998, Científico Internacional, XIII SBMicro International Conference on Microelectronics and Packaging, Vol. 1, pp.185-189, Curitiba, PR, BRASIL, 1998
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TATSCH, Peter Jurgen; DINIZ, J. A.; PUDENZI, M.A.A.; KRETLY, Luiz Carlos; HERION, J.K.; Thin nitrided-oxide films formed by low-energy and medium dose nitrogen implantation,, 08/1996, Científico Internacional, X Congress of the Brazilian Microeletronics Society and I Ibero Americ, Vol. S/N, pp.402-407, Águas de Lindoia, SP, BRASIL, 1996
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DINIZ, J. A.; TATSCH, Peter Jurgen; KRETLY, Luiz Carlos; C. DE QUEIROZ, Jose Eudoxio; GODOY FILHO, J.; Formation of Ultra-Thin Silicon Oxynitride Films by Low-Energy Nitrogen Implantation, 12/1995, Científico Internacional, 1995 FallMeeting, MRS Materials Research Society, Vol. S/N, Boston, Massachusetts,, ESTADOS UNIDOS DA AMERICA, 1995
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DINIZ, J. A.; TATSCH, Peter Jurgen; KRETLY, Luiz Carlos; QUEIROZ, J.E.C.; GODOY FILHO, J.; Formation of Ultra-Thin Oxynitride Films by Low-Energy Nitrogen Implantation, 12/1995, Científico Internacional, Ion-Solid Interaction for Materials Modification and Processing, Vol. S/N, pp.496-501, Boston, ESTADOS UNIDOS DA AMERICA, 1995
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DINIZ, J. A.; TATSCH, Peter Jurgen; KRETLY, Luiz Carlos; QUEIROZ, J.E.; GODOY, Filho; Formation of thin silicon oxynitride layers by low-energy nitrogen implantation, 08/1995, Científico Internacional, X SBMICRO, Vol. S/N, pp.383-391, Canela, SP, BRASIL, 1995
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RUFINO, F. C.; MARQUE, A. M. P.; R.G. LARRUDÉ, D.; ESPINDOLA, L. C. J.; CIOLDIN, F. H.; DINIZ, J. A.; Definition of CVD Graphene Micro Ribbons with Lithography and Oxygen Plasma Ashing, 10/2019, Científico Internacional, 66th International Symposium and Exhibition - AVS 2019, pp.225-225, Columbus, Ohio, ESTADOS UNIDOS DA AMERICA, 2019
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ALVAREZ, H. S.; DINIZ, J. A.; RUIZ, C. S.; SILVA, A. R.; CIOLDIN, F. H.; SALLES DO NASCIMENTO JUNIOR, Valter; Silicon Micro-Channel Definition Via ICP Plasma Etching Process Using Different Hard Masks, 10/2019, Científico Internacional, 66th International Symposium and Exhibition - AVS 2019, pp.105-105, Columbus, Ohio, ESTADOS UNIDOS DA AMERICA, 2019
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DINIZ, J. A.; SILVA, A. R.; Silicon Wet Etching Using NH4OH Solution For Texturing of Silicon Micro-Channels, 10/2019, Científico Internacional, 66th International Symposium and Exhibition - AVS 2019, pp.210-210, Columbus, Ohio, ESTADOS UNIDOS DA AMERICA, 2019
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SANTOS, M. V. P.; BARTH, Sven; BERON, F.; PIROTA, K. R.; DINIZ, J. A.; MOSHKALEV, Stanislav; UTKE, Ivo; Towards a simple and fast protocol for magnetoelectrical properties improvements of non-noble ferromagnetic nanocomposites grown by FEBID, 07/2018, Científico Internacional, 7th International Workshop on Focused Electron Beam-Induced Processing (FEBIP), Vol. 1, pp.1-3, Modena, ITALIA, 2018
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CÉSAR, R. R.; MARQUE, A. M. P.; DOI, I.; DINIZ, J. A.; Electrolyte-Insulator-Semiconductor (EIS) device with Different Integrated Reference Electrodes for pH Detecting, 10/2017, Científico Internacional, 64th International Symposium and Exhibition - AVS 2017, pp.263-263, Tampa, FL, ESTADOS UNIDOS DA AMERICA, 2017
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ALVAREZ, H. S.; SILVA, A. R.; GODOY FILHO, J.; CIOLDIN, F. H.; DINIZ, J. A.; Formation and Characterization of Hydrogenated Amorphous Silicon (a-Si:H) Thin Films Deposited by ECR-CVD with Different RF Powers, 11/2016, Científico Internacional, 63rd International Symposium and Exhibition - AVS 2016, pp.123-123, Nashville, TN, ESTADOS UNIDOS DA AMERICA, 2016
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LIMA, Vitor; DOI, I.; DINIZ, J. A.; CÉSAR, R. R.; Physical Characteristics of TiOx Thin Films Obtained by DC Reactive Sputtering, 11/2016, Científico Internacional, 63rd International Symposium and Exhibition - AVS 2016, pp.245-245, Nashville, TN, ESTADOS UNIDOS DA AMERICA, 2016
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SANTOS, M. V. P.; DINIZ, J. A.; UTKE, Ivo; VELO, M.; DOMINGOS, R. D.; ZHANG, Y.; MAEDER, Xavier; GUERRA-NUNEZ, Carlos; BERON, F.; PIROTA, K. R.; MOSHKALEV, Stanislav; Electric and Magnetic Transport Characterization of Post Growth Annealing Process of Co-C Grown by Focused-ElectronBeam-Induced Deposition, 10/2016, Científico Internacional, 61st Annual Conference on Magnetism and Magnetic Materials - MMM 2016, pp.1-4, New Orleans, LA, ESTADOS UNIDOS DA AMERICA, 2016
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SANTOS, M. V. P.; VELO, M. F.; DOMINGOS, R. D.; ZHANG, Yu.; MAEDER, Xavier; GUERRA-NUNEZ, Carlos; BERON, F.; PIROTA, K. R.; MOSHKALEV, Stanislav; DINIZ, J. A.; UTKE, Ivo; Electric and Magnetic transport characterization of post-growth annealing process of Co-C grown by focused-electron-beam-induced deposition, 07/2016, Científico Internacional, 6th Workshop on Focused Electron Beam-Induced Processing (FEBIP), Vol. 1, pp.1-3, Vienna, AUSTRIA, 2016
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SANTOS, M. V. P.; MAEDER, Xavier; GUERRA-NUNEZ, Carlos; BERON, F.; PIROTA, K. R.; MOSHKALEV, Stanislav; DINIZ, J. A.; UTKE, Ivo; Electrical transport improvements by post-growth annealing process of cobalt-carbon deposits grown by focused-electron-beam-induced deposition, 05/2016, Científico Internacional, 2016 Chemistry for ELectron-Induced NAnofabrication (CELINA), Vol. 1, pp.1-3, Krakow, POLONIA, 2016
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CARNIO, C. V.; LEONHARDT, A.; SILVA, A. R.; CIOLDIN, F. H.; DOI, I.; MANERA, L. T.; DINIZ, J. A.; TiN gate electrodes fabrication by Ti e-beam evaporation and ECR plasma nitridation, 03/2016, Científico Internacional, Materials for Advanced Metallization - MAM 2016, Vol., pp.1-4, Brussels, BELGICA, 2016. Resumo expandido
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MENDONÇA BADAN SOARES, Guilherme; SILVA, A. R.; CIOLDIN, F. H.; ESPINDOLA, L. C. J.; DOI, I.; DINIZ, J. A.; A New Alternative for Silicon Thinning using NH4OH Solution Wet Etching for 3D MOS Transistors, 10/2015, Científico Internacional, 62nd International Symposium and Exhibition -AVS 2015, pp.135-135, San Jose, CA, ESTADOS UNIDOS DA AMERICA, 2015
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MARQUE, A. M. P.; C. SILVA, Cecília; SOUZA, J.F.; KUBOTA, L.T.; FONSECA, L. R. C; DINIZ, J. A.; Development of Arrays of Field Effect Transistors Based on CVD Graphene and TaN as Metal Electrode, 10/2015, Científico Internacional, 62nd International Symposium and Exhibition -AVS 2015, pp.254-254, San Jose, CA, ESTADOS UNIDOS DA AMERICA, 2015
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ALMEIDA, C. R.; LIMA, L. P. B.; T. OBATA, Hélio; COTTA, Mônica A.; DINIZ, J. A.; N+-InGaP or N+-GaAs NanoWires for JunctionLess Transistors Fabricated by Focused Ion Beam (FIB) System,, 01/2015, Científico Internacional, 62nd International Symposium and Exhibition -AVS 2015, pp.124-124, San Jose, CA, ESTADOS UNIDOS DA AMERICA, 2015
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NASCIMENTO JÚNIOR, A. R.; MANERA, L. T.; DINIZ, J. A.; SILVA, A. R.; SANTOS, M. V. P.; SODRÉ JUNIOR, A. C.; FRATESCHI, N.C.; BARÊA, L. A. M.; Fabrication of Micro ring Resonators for Nonlinear Optics Applications using Silicon Nitride Film Deposited at Room Temperature Overcoming the Stress Limitation, 11/2014, Científico Internacional, 61st AVS International Symposium and Exhibition (AVS 2014), pp.1-4, Baltimore, MD, ESTADOS UNIDOS DA AMERICA, 2014
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CÉSAR, R. R.; BARROS, Angélica Denardi de; NASCIMENTO, R. O.; ALVES, OL; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Electrolyte Insulator Semiconductor Structure for Pb+Detecting, 09/2014, Científico Internacional, 28th European Conference on Solid-State Transducers, EUROSENSORS 2014, Vol. 1, pp.12-12, Brescia, ITALIA, 2014
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MAYER, R. A.; SANTOS, M. V. P.; LIMA, L. P. B.; DINIZ, J. A.; BERON, F.; PIROTA, K. R.; Dielectrophoretic manipulation of nickel nanowire, 09/2014, Científico Internacional, 61st AVS International Symposium and Exhibition (AVS 2014), Vol. 1, pp.1-3, Baltimore, MD, ESTADOS UNIDOS DA AMERICA, 2014
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MEDEROS, Melissa; MUNOZ, S. N. M.; DOI, I.; DINIZ, J. A.; Influence of the Deposition Time in Optical and Electric Characteristics of Ge Nanoparticles Grown in SiO2 by LPCVD Technique, 08/2014, Científico Internacional, 61st AVS International Symposium and Exhibition (AVS 2014), Vol., pp.238-238, Baltimore, MD, ESTADOS UNIDOS DA AMERICA, 2014
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DAVID MATEOS, Francisco; DINIZ, J. A.; MUNOZ, S. N. M.; NEDEV, N.; CURIEL, M.; MEDEROS, Melissa; VALDEZ, B.; MONTERO, G.; Low temperature thin dielectric films obtained by ECR-CVD for application in non-volatile memories, 08/2014, Científico Internacional, 61st AVS International Symposium and Exhibition (AVS 2014), pp.256-256, Baltimore, MD, ESTADOS UNIDOS DA AMERICA, 2014
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SILVA, CCC; SOUZA, J. F.; DOI, I.; DINIZ, J. A.; KUBOTA, L.T.; Wafer-scale Fabrication and Characterization of Chemiresistors Based on Multiwalled Carbon Nanotubes Networks, 11/2012, Científico Internacional, 2012 MRS Fall Meeting & Exhibit, Vol. 1, pp.1-1, Boston, ESTADOS UNIDOS DA AMERICA, 2012. Resumo expandido
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SWART, Jacobus Willibrordus; DINIZ, J. A.; MOSHKALEV, Stanislav; SOUZA, J. F.; Development of Microsensors and Applications under the INCT NAMITEC Network, 10/2012, Científico Internacional, Ibersensor 2012 - Ibero-American Congress on Sensors, Vol. 1, pp.1-2, Porto Rico, ESTADOS UNIDOS DA AMERICA, 2012
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DINIZ, J. A.; DOI, I.; Study of Structural and Optical Properties of Germanium Nanoparticles embedded in SiO2 Matrix, 09/2012, Científico Internacional, E-MRS 2012 Fall Meeting, Vol. 1, pp.1-1, Varsóvia, POLONIA, 2012. Resumo expandido
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DINIZ, J. A.; DOI, I.; MUNOZ, S. N. M.; Influence of the Time Exposure of the Germanic in the Growth of Ge Nanocrystals on Si Nuclei using the Technique of LPCVD, 09/2012, Científico Internacional, E-MRS 2012 Spring Meeting, Vol. 1, pp.1-3, Strasbourg, FRANCA, 2012. Resumo expandido
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LIMA, L. P. B.; DINIZ, J. A.; RADTKE, C.; DOI, I.; MIYOSHI, Juliana; SILVA, A. R.; GODOY FILHO, J.; Structural and Electrical Characteristics of TaN Film Deposited by DC Sputtering for MOS Capacitor and Schottky Diode Upper Electrodes, 11/2011, Científico Internacional, 58th Annual International Symposium and Exhibition - AVS 2011, Vol. 1, pp.243-243, Tennessee, ESTADOS UNIDOS DA AMERICA, 2011. Resumo expandido
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MIYOSHI, Juliana; SILVA, A. R.; CAVARSAN, F. A.; DINIZ, J. A.; LIMA, L. P. B.; TiAlO and TiAlON Obtained by e-Beam Evaporation with Additional Electron Cyclotron Resonance (ECR) Plasma Oxidation and Oxynitridation on Si for MOS Gate Dielectric, 11/2011, Científico Internacional, 58th Annual International Symposium and Exhibition - AVS 2011, Vol. 1, pp.243-243, Tennessee, ESTADOS UNIDOS DA AMERICA, 2011. Resumo expandido
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SILVA, A. R.; MIYOSHI, Juliana; CAVARSAN, F. A.; LIMA, L. P. B.; DINIZ, J. A.; Surface Texturing of Silicon for Solar Cells for CMOS Technology, 11/2011, Científico Internacional, 58th Annual International Symposium and Exhibition - AVS 2011, Vol. 1, pp.247-247, Tennessee, ESTADOS UNIDOS DA AMERICA, 2011. Resumo expandido
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LIMA, L. P. B.; DINIZ, J. A.; RADTKE, C.; DOI, I.; MIYOSHI, Juliana; SILVA, A. R.; GODOY FILHO, J.; Structural and Electrical Characteristics of TiN Film Deposited by DC Sputtering for MOS Capacitor and Schottky Diode Upper Electrodes, 10/2011, Científico Internacional, 58th Annual International Symposium and Exhibition - AVS 2011, Vol. 1, pp.243-243, Tennessee, ESTADOS UNIDOS DA AMERICA, 2011. Resumo expandido
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SOUZA, J. F.; MOREIRA, M. A.; DOI, I.; DINIZ, J. A.; TATSCH, Peter Jurgen; Preparation and Characterization of High-k Tantalum Pentoxide (Ta2O5) Thin Film for Sensors and Integrated Circuits Applications, 08/2011, Científico Internacional, 24th International Conference on Amorphous and Nanocrystalline Semiconductors - ICANS 24, Vol. 1, pp.282-282, Nara, JAPAO, 2011. Resumo expandido
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GOMES, A. L.; CAMPOS, Sinézio, J.C.C.; ZAKIA, M. B. P.; DINIZ, J. A.; Characterization of conducting nanocomposites with poly(vinylidine fluoride) used in devices electroluminescents, 07/2011, Científico Internacional, European Polymer Congress (EPF) 2011, XII GEP Congress, Vol. 1, pp.1-3, Granada, ESPANHA, 2011
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LIMA, L. P. B.; MOREIRA, M. A.; DINIZ, J. A.; DOI, I.; Titanium Nitride Deposited by DC Sputtering for MOS Gate Electrode Application, 07/2011, Científico Internacional, International Conference on the Formation of Semiconductor Interfaces 2011 - ICFSI-13, Vol. 1, pp.230-230, Praga, REPUBLICA TCHECA, 2011. Resumo expandido
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SOUZA, J. F.; MOREIRA, M. A.; DOI, I.; DINIZ, J. A.; TATSCH, Peter Jurgen; GONÇALVES, J.L.; Preparation and characterization of high-k Aluminum nitride (AlN) thin film for sensors and integrated circuits applications, 07/2011, Científico Internacional, International Conference on the Formation of Semiconductor Interfaces 2011 - ICFSI-13, Vol. 1, pp.1-1, Praga, REPUBLICA TCHECA, 2011. Resumo expandido
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LIMA, L. P. B.; MOREIRA, M. A.; DINIZ, J. A.; DOI, I.; Titanium Nitride Deposited by DC Sputtering for MOS Gate Electrode Application, 07/2011, Científico Internacional, International Conference on the Formation of Semiconductor Interfaces 2011 - ICFSI-13, Vol. 1, pp.1-1, Praga, REPUBLICA TCHECA, 2011. Resumo expandido
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MIYOSHI, Juliana; DINIZ, J. A.; DOI, I.; BARROS, Angélica Denardi de; VON ZUBEN, A.A.G.; Titanium-aluminum oxynitride (TAON) as high-k gate dielectric for sub-32 nm CMOS technology, 03/2009, Científico Internacional, International Conference on Materials for Advanced Metallization, MAM 2009, Vol. 1, pp.43-44, França, FRANCA, 2009. Resumo expandido
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BARROS, Angélica Denardi de; MIYOSHI, Juliana; DOI, I.; DINIZ, J. A.; Thin titanium oxide films deposited by e-beam evaporation with additional rapid thermal oxidation and annealing for ISFET application, 03/2009, Científico Internacional, International Conference on Materials for Advanced Metallization, MAM 2009, Vol. 1, pp.213-214, França, FRANCA, 2009. Resumo expandido
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KAUFMANN, P.; KORNBERG, M., ; H. LEVATO, ; MARCON, R., ; MELO, A. M.; PIAZZETTA, M.H., ; BAUER, O.H., ; ZAKIA, M. B. P.; BORTOLUCCI, Emilio Carlos; CASSIANO, M.M., ; DINIZ, J. A.; GODOY, R., ; KUDAKA, A.S., ; MARÚN, A., ; PEREYRA, P., ; POGLITSCH, A., ; SOUSA JÚNIOR., J., ; Development of subsystems for photometry and imaging in the Terahertz range., 12/2008, Científico Internacional, Workshop on Semiconductors and Micro & Nano-Technology - Seminatec 2008, Vol. 1, pp.1-3, São Paulo, SP, BRASIL, 2008
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CADILLO, R. F.; DOI, I.; DINIZ, J. A.; Physical Properties of (Al-Si-Cu)-N thin Films deposited by DC-reactive Magnetron Sputtering, 09/2008, Científico Internacional, Congresso Brasileiro de Aplicações de Vácuo na Indústria e na Ciência, XXIX - CBrAVIC, Vol. 1, pp.1-3, Santa Catarina, SC, BRASIL, 2008. Resumo expandido
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ANJOS, Alexandre; DOI, I.; DINIZ, J. A.; Raman characterization of SiGe nanostructures formed by Rapid Thermal Annealing, 06/2008, Científico Internacional, 14th International Conference on Solid Films and Surfaces - ICSFS-14, Vol. Wed-P-43, pp.352-353, Dublin, IRLANDA (EIRE), 2008. Resumo expandido
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SWART, Jacobus Willibrordus; ZOCCAL, LEONARDO BRESEGHELLO; DINIZ, J. A.; 10 GHz RF Passive Components Obtained by MCM-D Technology, 12/2007, Científico Internacional, 22nd Symposium on Microelectronics Technology and Devices - SBMicro 2007, Vol. 9, pp.405-414, Rio de Janeiro, RJ, BRASIL, 2007
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MSC. RICARDO COTRIN TEIXEIRA -, ; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; ZAKIA, M. B. P.; Structural and Surface Properties of SiGe Thin Films obtained by Reduced Pressure CVD., 11/2006, Científico Internacional, 13th International Conference on Solid Films and Surfaces, ICSFS-13, Vol. 1, pp.1-1, San Carlos de Bariloche, ARGENTINA, 2006
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RAMOS, A.C.S.; DINIZ, J. A.; PUDENZI, M.A.A.; DOI, I.; SWART, Jacobus Willibrordus; Aluminium Oxynitride Gate pMOSFET Formed by Sputtering DC Deposition in Nitrogen Ambient with Additional Rapid Thermal Oxidation and Anneling., 11/2006, Científico Internacional, 13th International Conference on Solid Films and Surfaces, ICSFS-13, Vol. 1, pp.1-1, San Carlos de Bariloche, ARGENTINA, 2006
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DINIZ, J. A.; MOSHKALEV, Stanislav; MANÊRA, G. A.; SANTOS, R. E.; DOI, I.; SWART, Jacobus Willibrordus; High K Titanium-Silicon Oxynitride Gate Dieletric Film, 11/2006, Científico Internacional, 13th International Conference on Solid Films and Surfaces, ICSFS-13, Vol. 1, pp.1-1, San Carlos de Bariloche, ARGENTINA, 2006
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FREITAS, JN; NOGUEIRA, A. F.; DINIZ, J. A.; FRATESCHI, N.C.; Dye-sensitized solar cells assembled with a polymeric electrolyte: an alternative for energy conversion, 02/2006, Científico Internacional, Workshop on Semiconductors and Micro & Nano Technology - SEMINATEC 2006, Vol. 1, pp.50-50, Campinas, SP, BRASIL, 2006
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NELI, ROBERTO RIBEIRO; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Process Development for Far Infrared Sensor Fabrication, 09/2005, Científico Internacional, Eurosensors XIX, Vol. II, pp.1-2, Barcelona, ESPANHA, 2005. Resumo expandido
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OLIVEIRA JÚNIOR, A. C.; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Thermo-Electrical Characterization of Polysilicon Hot-Wire Flow Microsensors, 09/2005, Científico Internacional, Eurosensors XIX, Vol. II, pp.1-2, Barcelona, ESPANHA, 2005. Resumo expandido
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MSC. RICARDO COTRIN TEIXEIRA -, ; DOI, I.; DINIZ, J. A.; ZAKIA, M. B. P.; SWART, Jacobus Willibrordus; "Low electrical resistivity polycrystalline SiGe films ibtained by vertical LPCVD for MOS devices", 06/2005, Científico Internacional, European Materials Research Society, Vol. 1, pp.1-3, STRASBURGO, FRANCA, 2005
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DOI, I.; C. TEIXEIRA, Ricardo; SANTOS, R. E.; DINIZ, J. A.; SWART, Jacobus Willibrordus; G. DOS SANTOS FILHO, Sebastião; Thermal Stability of ni(Pt) Silicide Films Formed on Poly-Si, 03/2005, Científico Internacional, The European Workshop Materials for Advanced Metallization - MAM 2005, Vol. 1, pp.147-148, Dresden, ALEMANHA, 2005. Resumo expandido
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MUNOZ, S. N. M.; GRADOS, H. R. Jimenez; FERREIRA DA SILVA, Isaias; DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; High Performance Active Pixel Sensors Fabricated in a Standar 2.0 um CMOS Technology, 11/2004, Científico Internacional, IEEE International Caracas Conference on Devices, Circuits and Systems, Vol. 1, pp.276-277, Punta Cana, REPUBLICA DOMINICANA, 2004
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DOI, I.; C. TEIXEIRA, Ricardo; DINIZ, J. A.; HAYASHI, Marcelo A.; SWART, Jacobus Willibrordus; G. DOS SANTOS FILHO, Sebastião; Phase Shift of Ni and Ni(Pt) Silicides by XAFS Measurements, 07/2004, Científico Internacional, 16th International Vacuum Congress - IVC-16, Vol. 1, pp.234-234, Veneza, ITALIA, 2004
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C. TEIXEIRA, Ricardo; DOI, I.; SCORALICK JUNIOR, C.; DINIZ, J. A.; ZAKIA, M. B. P.; SWART, Jacobus Willibrordus; Stress Analysis of Rapid Thermal Annealed Polycrystalline Silicon Thin Films Deposited by Reduced Pressure Vertical CVD, 07/2004, Científico Internacional, 16th International Vacuum Congress - IVC-16, Vol. 1, pp.598-598, Veneza, ITALIA, 2004
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FINARDI, M. R.; DOI, I.; C. TEIXEIRA, Ricardo; DINIZ, J. A.; SWART, Jacobus Willibrordus; Differences in Wet Isotropic Etching - NH4OH and Wet Anisotropic Etchings Based on NH4OH, KOH, KOH+2-Propanol and TMAH for Silicon Micromachining Technology, 07/2004, Científico Internacional, 16th International Vacuum Congress - IVC-16, Vol. 1, pp.590-590, Veneza, ITALIA, 2004
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NELI, ROBERTO RIBEIRO; DOI, I.; GODOY FILHO, J.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Deposition and Characterization of Gold for Micromachined Bolometers Utilized as Detector of Infrared Radiation, 07/2004, Científico Internacional, 16th International Vacuum Congress - IVC-16, Vol. 1, pp.953-953, Veneza, ITALIA, 2004
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SANTOS, R. E.; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; G. DOS SANTOS FILHO, Sebastião; Microstructure Characterization of Agglomerations Formed on Ni and Ni(Pt) Silicide thin Films with SEM/EDS, 12/2003, Científico Internacional, ICMAT 2003 - International Conference on Materials for Advanced Technologies, Vol. 1, pp.529-529, Singapore, CINGAPURA, 2003
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RAMOS, A.C.S.; DINIZ, J. A.; PUDENZI, M.A.A.; DOI, I.; SWART, Jacobus Willibrordus; Aluminum Oxynitride Gate PMOSFET Formed by Sporttering dc Deposition in Nitrogen Ambient with Additional Rapid Thermal Oxidation and Annealing, 12/2003, Científico Internacional, ICMAT 2003 - International Conference on Materials for Advanced Technologies, Vol. 1, pp.539-539, Singapore, CINGAPURA, 2003
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HAYASHI, M. A.; QUEIROZ, J. E. C.; DINIZ, J. A.; SWART, Jacobus Willibrordus; PUDENZI, M.A.A.; "Shallow Junction Formation by Rapid Thermal Annealing of Boron Implanted Silicon with Fluorine Preamorphization", 05/2002, Científico Internacional, 201ST Meeting of the Electrochemical Society Symposium, Vol. 1, pp.1-1, Philadelphia, ESTADOS UNIDOS DA AMERICA, 2002
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DINIZ, J. A.; GODOY FILHO, J.; DOI, I.; SWART, Jacobus Willibrordus; Proton Radiation Hardening Study of Oxynitride Gate NMOSFETs Formed by Low Energy Nytrogen Implantation into Silicon Prior to Oxidation, 09/2001, Científico Internacional, RADECS2001 - 6th European Conference on Radiation and its Effects on Components and Systems, Vol. 1, pp.21-21, Grenoble, FRANCA, 2001
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SWART, Jacobus Willibrordus; DINIZ, J. A.; RAMOS, A. C. M.; LUJAN, G.S.; Electrical Characterization of Aluminium Oxynitride Gate pMOSFET Formed by DC Sputtering Deposition with Additional Rapid Thermal Oxidation and Annealing, 09/2001, Científico Internacional, MRS International Workshop on Device Technology, Vol. 1, pp.1-1, Porto Alegre, RS, BRASIL, 2001
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SWART, Jacobus Willibrordus; DINIZ, J. A.; TATSCH, Peter Jurgen; Characteristics of Silicon Oxinitrides Made By ECR Plasmas, 03/2001, Científico Internacional, 199th Meeting of the Elctrochemical Society, Vol. 1, pp.1-1, ESTADOS UNIDOS DA AMERICA, 2001
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SWART, Jacobus Willibrordus; DINIZ, J. A.; TATSCH, Peter Jurgen; GODOY, J.; Radiation Hardening of oxynitrides formed by Low Energy Nitrogen implantation into silicon Prior to Oxidation, 03/2001, Científico Internacional, 199th Meeting of the Elctrochemical Society, Vol. 1, pp.162-163, ESTADOS UNIDOS DA AMERICA, 2001
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MOSKALYOV, A.S.; REYES-BETANZO, C.; RAMOS, A.C.; DINIZ, J. A.; SWART, Jacobus Willibrordus; A Comparative Study of W, WNx and SiRIE in SF6/Ar Using Actinometry Technique, 10/2000, Científico Internacional, Vacuum Society 47th international Symposium, Vol. 1, pp.95-95, Boston, ESTADOS UNIDOS DA AMERICA, 2000
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YOSHIOKA, R.T.; BARROS JR., Luiz Eugenio M. de; DINIZ, J. A.; SWART, Jacobus Willibrordus; Improving performance of microwave AlGaAs/GaAs HBT's using novel SiNx passivation process, 08/1999, Científico Internacional, IMOC'99 - Int. Microwave and Optoelectronics Conference, Vol. s/n, pp.547-550, Rio de Janeiro, RJ, BRASIL, 1999
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MUNOZ, S. N. M.; DINIZ, J. A.; FRATESCHI, N.C.; Laser reflectometry applied to the in situ etching control in an electron cyclotron resonance plasma system, 08/1999, Científico Internacional, IMOC'99 - Int. Microwave and Optoelectronics Conference, Vol. s/n, pp.6-6, Rio de Janeiro, RJ, BRASIL, 1999
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SWART, Jacobus Willibrordus; DINIZ, J. A.; DOI, I.; BICA DE MORAES, M.A.; Modification of the refractive index and the dieletric constant of silicon dioxide by means of ion implantation, 07/1999, Científico Internacional, 10th International Conf. on Radiation Effects in Insulators, Vol. s/n, pp.1-1, Jena, ALEMANHA, 1999
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SWART, Jacobus Willibrordus; DINIZ, J. A.; SOTERO F. MACEDO, Anna Paula; LUJAN, G.S.; TATSCH, Peter Jurgen; High quality ultra-thin oxynitride films formed by low-energy nitrogen implantation into Silicon with additional plasma or thermal oxidation, 07/1999, Científico Internacional, 10th International Conf. on Radiation Effects in Insulators, Vol. 1, pp.1-1, Jena, ALEMANHA, 1999
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SWART, Jacobus Willibrordus; DINIZ, J. A.; DOI, I.; Modification of the dielectric constant of silicon dioxide by means of ion implantaation, 07/1999, Científico Internacional, 10th International Conference on Radiation Effectsin Insulators, Vol. 1, pp.1-1, ALEMANHA, 1999
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PANEPUCCI, R.R.; DINIZ, J. A.; CARLI, E.; TATSCH, Peter Jurgen; SWART, Jacobus Willibrordus; Silicon nitride deposition by electron cyclotron resonnce plasma enhanced chemical vapor deposition for micromachining applications, 09/1998, Científico Internacional, SPIE's 1998, Vol. 1, pp.146-151, Santa Clara, ESTADOS UNIDOS DA AMERICA, 1998
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MOSHKALEV, Stanislav; DINIZ, J. A.; TATSCH, Peter Jurgen; SARAGOSSA RAMOS, A.C.; Spectroscopic Determination of Electron Parameters in Low-Pressure High Density ECR Plasma in Ar/N2SiH4 Used for Silicon Nitride Deposition, 08/1998, Científico Internacional, ESCAMPIG 98 - Fourteenth European Conference on the Atomic and Molecular Physics of Ionised Gases, Vol. 22H, pp.13-14, Malahide, IRLANDA (EIRE), 1998
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PUDENZI, M.A.A.; DINIZ, J. A.; TATSCH, Peter Jurgen; HERION, J.K.; MÜCH, A.; SIMS Analyses of Silicon-Oxynitride Films Formed by N(2+) and No(+) Implantation, 09/1997, Científico Internacional, SIMS XI International Conference, Vol. s/n, pp.249-252, Orlando/Flórida, ESTADOS UNIDOS DA AMERICA, 1997
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SANTOS, M. V. P.; BARTH, Sven; BERON, F.; PIROTA, K. R.; DINIZ, J. A.; MOSHKALEV, Stanislav; UTKE, Ivo; Magnetoelectrical Transport Improvements of Postgrowth Annealed Iron-Cobalt Nanocomposites: A Route for Future Room-Temperature Spintronics, 09/2019, Científico Nacional, XVIII Brazilian MRS Meeting (SBPMat), Vol. 1, pp.1-3, Balneário Camboriú, SC, BRASIL, 2019
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SANTOS, M. V. P.; BERON, F.; PIROTA, K. R.; MOSHKALEV, Stanislav; DINIZ, J. A.; UTKE, Ivo; Magnetoelectrical Transport Improvements of Postgrowth Annealed Iron_Cobalt Nanocomposites_A Route for Future Room-Temperature Spintronics, 04/2019, Científico Nacional, XIV Workshop on Semiconductors and Micro & Nano Technology (SEMINATEC 2019), pp.1-3, Campinas, SP, BRASIL, 2019
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SANTOS, M. V. P.; CARVALHO, P. G.; ZHANG, Yu.; GUERRA-NUNEZ, Carlos; BERON, F.; PIROTA, K. R.; MOSHKALEV, Stanislav; DINIZ, J. A.; UTKE, Ivo; Enhanced electrical and magnetic properties of novel non-noble ferromagnetic nanocomposites grown by focused-electron-beam-induced deposition, 10/2017, Científico Nacional, XVI SBPMat - Sociedade Brasileira de Pesquisa em Materiais, Vol., pp.1-2, Gramado, RS, BRASIL, 2017
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SANTOS, M. V. P.; VELO, M. F.; DOMINGOS, R. D.; DINIZ, J. A.; BERON, F.; PIROTA, K. R.; Electronic transport properties of single nickel nanowires, 09/2016, Científico Nacional, XV Brazil MRS Meeting - Encontro da Sociedade Brasileira de Pesquisa em Materiais - SBPMat, Vol., pp.1-3, Campinas, SP, BRASIL, 2016
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SANTOS, M. V. P.; VELO, M. F.; DOMINGOS, R. D.; ZHANG, Yu.; MAEDER, Xavier; GUERRA-NUNEZ, Carlos; BERON, F.; PIROTA, K. R.; MOSHKALEV, Stanislav; DINIZ, J. A.; UTKE, Ivo; Electric transport characterization of postgrowth annealing process of Co-C grown by focused-electron-beam-induced deposition, 09/2016, Científico Nacional, XV Brazil MRS Meeting - Encontro da Sociedade Brasileira de Pesquisa em Materiais - SBPMat, Vol., pp.1-3, Campinas, SP, BRASIL, 2016
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MAYER, R. A.; SANTOS, M. V. P.; LIMA, L. P. B.; DINIZ, J. A.; BERON, F.; PIROTA, K. R.; Parameters optimization for individual magnetic nanowires manipulation through dielectrophoresis for electronic transport measurements, 05/2015, Científico Nacional, XXXVIII Encontro Nacional de Física da Matéria Condensada (ENFMC), Vol. 1, pp.1-3, Foz de Iguaçu, PR, BRASIL, 2015
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DINIZ, J. A.; DOI, I.; MUNOZ, S. N. M.; Optical Properties of SiFe Nanoparticles grown by LPCVD, 09/2012, Científico Nacional, XI Encontro da SBP - XI Brazilian Materials Research Society Meeting, Vol. 1, pp.1-3, Florianópolis, SC, BRASIL, 2012. Resumo expandido
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DINIZ, J. A.; DOI, I.; GODOY FILHO, J.; Characterization of Silicon Oxide obtained by Reactive Magnetron Sputtering, 09/2012, Científico Nacional, XI Encontro da SBP - XI Brazilian Materials Research Society Meeting, Vol. 1, pp.1-3, Florianópolis, SC, BRASIL, 2012. Resumo expandido
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KAUFMANN, P.; DINIZ, J. A.; ZAKIA, M. B. P.; BORTOLUCCI, E.C.; FLAKER, Alexandre; THz band-pass resonant metal mesh filters for a space solar photometry experiment, 04/2012, Científico Nacional, VII SEMINATEC 2012 - VII Workshop on Semiconductors and Micro & Nano Technology, Vol. 1, pp.85-86, São Bernardo do Campo, SP, BRASIL, 2012
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KAUFMANN, P.; DINIZ, J. A.; ZAKIA, M. B. P.; BORTOLUCCI, E.C.; A prototype photometer for terahertz solar flares observations, 04/2012, Científico Nacional, VII SEMINATEC 2012 - VII Workshop on Semiconductors and Micro & Nano Technology, Vol. 1, pp.81-82, São Bernardo do Campo, SP, BRASIL, 2012
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SOUZA, J. F.; MOREIRA, M. A.; DOI, I.; DINIZ, J. A.; TATSCH, Peter Jurgen; Growth and characterization of TiO2 thin films prepared by DC reactive magnetron sputter at room temperature, 09/2011, Científico Nacional, X Encontro Anual da Sociedade Brasileira de Pesquisa em Materiais (SBPMat), Vol. 1, pp.101-101, Gramado, RS, BRASIL, 2011
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KAUFMANN, P.; DINIZ, J. A.; ZAKIA, M. B. P.; BORTOLUCCI, E.C.; Fotometria e Imageamento na Banda Thz do Espectro, 03/2011, Científico Nacional, V Workshop INCT - Namitec (Instituto Nacional de Ciência e Tecnologia de Sistemas Micro e Nanoeletrônicos), Vol. 1, pp.1-3, Campinas, SP, BRASIL, 2011
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DINIZ, J. A.; KAUFMANN, P.; ZAKIA, M. B. P.; BORTOLUCCI, E.C.; Photometry of THz Radiation using Golay Cell Detector, 03/2011, Científico Nacional, VI Workshop on Semiconductors and Micro & Nano Technology - SEMINATEC 2011, Vol. 1, pp.1-3, CAMPINAS, SP, BRASIL, 2011
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FREITAS, JN; CAETANO, W L; DINIZ, J. A.; FRATESCHI, N.C.; NOGUEIRA, A. F.; Introdução de Grids metálicos em células solares de TiO2/corante com área de 4,5 cm2: análise do desempenho, 05/2007, Científico Nacional, 30ª Reunião Anual da Sociedade Brasileira de Química - SBQ, Vol. TC005, pp.1-3, Águas de Lindóia, SP, BRASIL, 2007
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GRADOS, H. R. Jimenez; MANERA, LEANDRO TIAGO; MSC. RICARDO COTRIN TEIXEIRA -, ; FINARDI, M. R.; DINIZ, J. A.; DOI, I.; HERNANDEZ FIGUEROA, Hugo Enrique; SWART, Jacobus Willibrordus; Fabrication and characterization of an p-MOS with poly-Si/SiGe gate in a standard 2nm CMOS technology, 05/2007, Científico Nacional, Workshop on Semiconductors and Micro & Nano-Technology - SEMINATEC 2007, Vol. 1, pp.1-3, Campinas, SP, BRASIL, 2007
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C. TEIXEIRA, Ricardo; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; ZAKIA, M. B. P.; Morphological Study of Polycrystalline SiGe alloy deposited by Vertical LPCVD, 04/2005, Científico Nacional, 12th Brazilian workshop on semiconductor physics., Vol. 1, pp.1-1, São José dos Campos-SP, SP, BRASIL, 2005
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C. TEIXEIRA, Ricardo; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; ZAKIA, M. B. P.; Deposition of Polycrystallyne Si(1-x)Ge(x) Alloy Using Vertical LPCVD System, 07/2004, Científico Nacional, III Encontro da SBPMat Brazilian MRS Meeting 2004, Vol. 1, pp.74-74, Foz de Iguaçu, PR, BRASIL, 2004
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C. TEIXEIRA, Ricardo; DOI, I.; ZAKIA, M. B. P.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Micro-Raman Stress Characterization of Polycrystalline Silicon Films Grown at High Temperature, 10/2003, Científico Nacional, II Encontro da Sociedade Brasileira de Pesquisa em Materiais - SBPMat, Vol. 1, pp.51-51, Rio de Janeiro, RJ, BRASIL, 2003
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SANTOS, R. E.; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Investigation of Ni Silicides Formation on (100) Si By X-Ray Diffraction (XRD), 07/2003, Científico Nacional, XXIV CBrAVIC - Congresso Brasileiro de Aplicações de Vácuo na Indústria e na Ciência, Vol. 1, pp.119-119, Bauru, SP, BRASIL, 2003
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C. TEIXEIRA, Ricardo; DOI, I.; DINIZ, J. A.; ZAKIA, M. B. P.; SWART, Jacobus Willibrordus; Deposition Rate of Si-Poly Obtained in Vertical CVD at Reduced Pressure, 07/2003, Científico Nacional, XXIV CBrAVIC - Congresso Brasileiro de Aplicações de Vácuo na Indústria e na Ciência, Vol. 1, pp.108-108, Bauru, SP, BRASIL, 2003
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C. TEIXEIRA, Ricardo; DOI, I.; DINIZ, J. A.; SWART, Jacobus Willibrordus; ZAKIA, M. B. P.; XRD Study of High Temperature Si-Poly Deposited in Vertical LPCVD, 07/2003, Científico Nacional, XXIV CBrAVIC - Congresso Brasileiro de Aplicações de Vácuo na Indústria e na Ciência, Vol. 1, pp.107-107, Bauru, SP, BRASIL, 2003
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DINIZ, J. A.; DOI, I.; SWART, Jacobus Willibrordus; Insulators Made by ECR Plasmas on Si or GaAs Substrates at Room Temperature, 07/2002, Científico Nacional, I Encontro da Sociedade Brasileira de Pesquisa em Materiais - SBPMat Brazil-MRS, Vol. 1, pp.131-131, Rio de Janeiro, RJ, BRASIL, 2002
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C. TEIXEIRA, Ricardo; DOI, I.; ZAKIA, M. B. P.; SWART, Jacobus Willibrordus; DINIZ, J. A.; Deposition and Characterization of LPCVD Polycrystalline Silicon, 11/2001, Científico Nacional, XVI Congresso Brasileiro de Engenharia Mecânica - COBEM2001, Vol. 1, pp.1-1, Uberlândia, MG, BRASIL, 2001
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MOSHKALEV, Stanislav; REYES-BETANZO, C.; SARAGOSSA RAMOS, A.C.; DINIZ, J. A.; SWART, Jacobus Willibrordus; Mechanistics Study of Silicon and Tungsten Plasma Etching in SF/Ar Using Optical Emission Spectroscopy, 08/2000, Científico Nacional, Congresso Brasileiro de Aplicações de Vácuo na indústria e na Ciência, Vol. 1, pp.90-90, São josé dos Campos, SP, BRASIL, 2000
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GUTIERREZ, H.R.; COTTA, M.A.; DINIZ, J. A.; GOBBI, A.L.; Substrate surface preparation for selective area epitaxy, 03/1998, Científico Nacional, XXI ENFMC, Vol. s/n, pp.20-20, Caxambú, SP, BRASIL, 1998
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LEONHARDT, A. (Autor); MANERA, L. T. (Autor); LIMA, L. P. B. (Autor); SANTOS, M. V. P. (Autor); DINIZ, J. A. (Autor); The 60th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - EIPBN 2016, (31/05/2016 a 03/06/2016), Pittsburgh, PA, ESTADOS UNIDOS DA AMERICA, Oral: Ga+ Focused Ion Beam lithography as a Viable Alternative for Multiple fin FinFET Prototyping
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BARROS, Angélica Denardi de (Autora); DOI, I. (autor); SWART, Jacobus Willibrordus (autor); DINIZ, J. A. (autor); 29th Symposium on Microelectronics Technology and Devices - SBMICRO 2014, (01/09/2014 a 05/09/2014), Aracaju, SE, BRASIL, Oral: Thin titanium oxide films deposited by e-beam evaporation or by sputtering technique with additional rapid
thermal oxidation
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KAUFMANN, P. (Autor); DINIZ, J. A. (Docente); SWART, Jacobus Willibrordus (Docente); ZAKIA, M. B. P. (Autor); BORTOLUCCI, Emilio Carlos (Funcionário Técnico); SPIE - Society of Photo-Optical Instrumentation Engineers: Space Telecopes and Instrumentation 2012: Optical, Infrared and Millimeter Wave, (01/09/2012 a 09/09/2012), -, ESTADOS UNIDOS DA AMERICA, Oral: SOLAR-T: Terahertz Photometers to Observe Solar Flare Emission on Stratospheric Balloon Flights
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FURTADO, A. S. O. (Autor); DINIZ, J. A. (Autor); W. DE LIMA MONTEIRO, D. (Autor); 24th Symposium on Microelectronics Technology and Devices - SBMicro 2009, (31/08/2009 a 03/09/2009), Natal, RN, BRASIL, Oral: Fabrication and Characterization of Active Pixel Sensors (APS) Using Simple Metal Gate nMOS Technology
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FELIPE LORENZO DELLA LUCIA - I, (autor); SWART, Jacobus Willibrordus (autor); B. ZOCCAL, Leonardo (autor); DINIZ, J. A. (autor); DOI, I. (autor); FRATESCHI, N.C. (Docente); Workshop Semestral do Instituto do Milênio-NAMITEC, (30/08/2008 a 06/09/2008), Gramado, RS, BRASIL, Oral: Simulation and Fabrication of Suspended-Membrane Resistive Microbolometers Using Gold-Black as Absorber
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ELEOTÉRIO, M. A. S. (Autor); DOI, I. (Autor); CADILLO, R. F. (Autor); DINIZ, J. A. (Autor); G. DOS SANTOS FILHO, Sebastião (Autor); 23rd Symposium on Microeletronics Technology and Devices, SBMicro 2008, (31/08/2008 a 04/09/2008), Gramado, RS, BRASIL, Oral: Post-Silicidation Annealiing Effects on Electrical and Structural Properties of NiPt Germanosilicide
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SWART, Jacobus Willibrordus (Autor); ZOCCAL, LEONARDO BRESEGHELLO (Autor); DINIZ, J. A. (Autor); GODOY FILHO, J. (Autor); DALTRINI, A.M. (Autor); 22nd Symposium on Microelectronics Technology and Devices - SBMicro 2007, (03/09/2007 a 06/09/2007), Rio de Janeiro, RJ, BRASIL, Oral: ZOCCAL, Leonardo Breseghello ; DINIZ, J. A. ; FO, J Godoy ; DALTRINI, Andre Mascia ; Swart, Jacobus W. . ECR-CVD SiNx Passivation in GaAs-Based MISFET Devices. In: 22th International Symposium on Microelectronics Technology and Devices - SBMicro 2007, 2007. 22th International Symposium on Microelectronics Technology and Devices - SBMicro 2007, 2007. v. 9. p. 159-168.
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OLIVEIRA JÚNIOR, A. C. (Autor); DOI, I. (Autor); DINIZ, J. A. (Autor); 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, (04/09/2005 a 07/09/2005), Florianópolis, SC, BRASIL, Oral: A Comparative Analysis of Electrical Characteristics of Silicon Micro-Heaters for Thermal Transducers Applications
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MUNOZ, S. N. M. (Autor); RODRIGUES, E. (Autor); GRADOS, H. R. Jimenez (Autor); DINIZ, J. A. (Autor); DOI, I. (Autor); SWART, Jacobus Willibrordus (Autor); 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, (04/09/2005 a 07/09/2005), Florianópolis, SC, BRASIL, Oral: Characterization and Performance Evaluation of an APS Pixel in a Standart 2 um CMOS Technology
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C. TEIXEIRA, Ricardo (Autor); DOI, I. (Autor); ZAKIA, M. B. P. (Autor); DINIZ, J. A. (Autor); 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, (04/09/2005 a 07/09/2005), Florianópolis, SC, BRASIL, Oral: Morphological and Electrical Study of Poly-SiGe Alloy Deposited by Vertical LPCVD
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DINIZ, J. A. (Autor); DOI, I. (Autor); NELI, ROBERTO RIBEIRO (Autor); 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, (04/09/2005 a 07/09/2005), Florianópolis, SC, BRASIL, Oral: Process Optimization for Microbolometers Fabrication
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BIASOTTO, C. (Autor); BOSCOLI, F. A. (Autor); C. TEIXEIRA, Ricardo (Autor); RAMOS, A.C.S. (Autor); DINIZ, J. A. (Autor); DALTRINI, A.M. (Autor); MOSHKALEV, Stanislav (Autor); DOI, I. (Autor); 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, (04/09/2005 a 07/09/2005), Florianópolis, SC, BRASIL, Oral: Silicon Oxide Sacrificial Layer dor MEMS Applications
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SANTOS, R. E. (Autor); DOI, I. (Autor); HAYASHI, M.A. (Autor); DINIZ, J. A. (Autor); G. DOS SANTOS FILHO, Sebastião (Autor); 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, (04/09/2005 a 07/09/2005), Florianópolis, SC, BRASIL, Oral: Thermal Stability of Ni/Pt Silicide Films on BF Doped and Undoped (100)Si
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NELI, ROBERTO RIBEIRO (Autor); DOI, I. (Autor); DINIZ, J. A. (Autor); SWART, Jacobus Willibrordus (Autor); Eurosensors XIX, (11/09/2005 a ), Barcelona, ESPANHA, Oral: Process Development for Far Infrared Sensor Fabrication.
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OLIVEIRA JÚNIOR, A. C. (Autor); DOI, I. (Autor); DINIZ, J. A. (Autor); SWART, Jacobus Willibrordus (Autor); Eurosensors XIX, (11/09/2005 a ), Barcelona, ESPANHA, Oral: Thermo-Electrical Characterization of Polysilicon Hot-Wire Flow Microsensors
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SANTOS, Regis (Autor); DOI, I. (Autor); DINIZ, J. A. (Autor); SWART, Jacobus Willibrordus (Autor); 20th Symposium on Microelectronics Technology and Devices - SBMicro 2005, (04/09/2005 a 07/09/2005), Florianópolis, SC, BRASIL, Oral: "Thermal stability of Ni/Pt Siliciude Films on BF Doped and Undoped (100) Si"
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MSC. RICARDO COTRIN TEIXEIRA -, (Autor); DOI, I. (Autor); DINIZ, J. A. (Autor); ZAKIA, M. B. P. (Autor); SWART, Jacobus Willibrordus (Autor); European Materials Research Society, (31/05/2005 a 03/06/2005), STRASBURGO, FRANCA, Oral: "Low electrical resistivity polycrystalline SiGe films ibtained by vertical LPCVD for MOS devices"
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DOI, I. (Autor); C. TEIXEIRA, Ricardo (Autor); SANTOS, R. E. (Autor); DINIZ, J. A. (Autor); SWART, Jacobus Willibrordus (Autor); G. DOS SANTOS FILHO, Sebastião (Autor); The European Workshop Materials for Advanced Metallization - MAM 2005, (06/03/2005 a 09/03/2005), Dresden, ALEMANHA, Oral: Thermal Stability of Ni/Pt Silicide Films Formed on Poly-Si
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MUNOZ, S. N. M. (autor); GRADOS, H. R. Jimenez (Autor); FERREIRA DA SILVA, Isaias (Autor); DINIZ, J. A. (Autor); DOI, I. (Autor); SWART, Jacobus Willibrordus (Autor); IEEE International Caracas Conference on Devices, Circuits and Systems, (03/11/2004 a 05/11/2004), Punta Cana, REPUBLICA DOMINICANA, Oral: High Performance Active Pixel Sensors Fabricated in a Standar 2.0 um CMOS Technology
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MUNOZ, S. N. M. (autor); GRADOS, H. R. Jimenez (Autor); FERREIRA DA SILVA, Isaias (Autor); RODRIGUES, E. (Autor); DINIZ, J. A. (Autor); DOI, I. (Autor); SWART, Jacobus Willibrordus (Autor); IV CONGRESSO IBEROAMERICANO DE SENSORES - IberSensor 2004, (27/10/2004 a 29/10/2004), Puebla, MEXICO, Oral: Active Pixel Sensors Fabricated in a Standard 2.0 um CMOS Technology
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FIORAVANTE JUNIOR, N. P. (Autor); MANERA, LEANDRO TIAGO (Autor); MOSHKALEV, Stanislav (Autor); DINIZ, J. A. (Autor); TATSCH, Peter Jurgen (Autor); GRADOS, H. R. Jimenez (Autor); SWART, Jacobus Willibrordus (Autor); 19th Symposium on Microelectronics Technology and Devices - SBMICRO 2004, (07/09/2004 a 11/09/2004), Porto de Galinhas, PE, BRASIL, Oral: Precise Control on Micron and Submicron Feature Dimensions in Photolithography for MOS and MEMS Applications
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MAMEDE, G. L. (Autor); OLIVEIRA JÚNIOR, A. C. (Autor); DOI, I. (Autor); DINIZ, J. A. (Autor); SWART, Jacobus Willibrordus (Autor); Student Forum on Microelectronics 2004 - SBFORUM 2004, (07/09/2004 a 11/09/2004), Porto de Galinhas, PE, BRASIL, Oral: Conditioning and Interface Circuits for Thermo-Resistive Temperature Microsensor with Digital Output
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C. TEIXEIRA, Ricardo (Autor); DOI, I. (Autor); SCORALICK JUNIOR, C. (Autor); DINIZ, J. A. (Autor); ZAKIA, M. B. P. (Autor); SWART, Jacobus Willibrordus (Autor); 16th International Vacuum Congress - IVC-16, (28/06/2004 a 02/07/2004), Veneza, ITALIA, Oral: Stress Analysis of Rapid Thermal Annealed Polycrystalline Silicon Thin Films Deposited by Reduced Pressure Vertical CVD
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DOI, I. (Autor); C. TEIXEIRA, Ricardo (Autor); DINIZ, J. A. (Autor); SWART, Jacobus Willibrordus (Autor); 16th International Vacuum Congress - IVC-16, (28/06/2004 a 02/07/2004), Veneza, ITALIA, Oral: Differences in Wet Isotropic Etching - NH4OH and Wet Anisotropic Etchings Based on NH4OH, KOH, KOH+2-Propanol and TMAH for Silicon Micromachining Technology
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NELI, ROBERTO RIBEIRO (Autor); DOI, I. (Autor); GODOY FILHO, J. (Autor); DINIZ, J. A. (Autor); SWART, Jacobus Willibrordus (Autor); 16th International Vacuum Congress - IVC-16, (28/06/2004 a 02/07/2004), Veneza, ITALIA, Oral: Deposition and Characterization of Gold for Micromachined Bolometers Utilized as Detector of Infrered Radiation
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MUNOZ, S. N. M. (Autor); GRADOS, H. R. Jimenez (Autor); DINIZ, J. A. (Autor); DOI, I. (Autor); SWART, Jacobus Willibrordus (Autor); IEEE INTERNATIONAL CARACAS CONFERENCE ON DEVICES, CIRCUITS AND SYSTEMS, (17/04/2004 a 20/04/2004), CARACAS, MEXICO, Oral: High Performance Active Pixel Sensors Fabricated in a Standard 2.0 um CMOS Technology
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GRADOS, H. R. Jimenez (Autor); MANERA, LEANDRO TIAGO (Autor); CAMOLESI, A. (Autor); FRUETT, Fabiano (Autor); DINIZ, J. A. (Autor); TATSCH, Peter Jurgen (Autor); INTERNATIONAL CONFERENCE ON SIGNALS AND ELECTRONIC SYSTEMS - ICSES'04, (13/09/2004 a 15/09/2004), POZNAN, POLONIA, Oral: A CMOS Technology for Educational Activities and Academic Projects
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FRATESCHI, N.C. (Coordenador); DINIZ, J. A. (co-autor); MUNOZ, S. N. M. (co-autor); International Microwave and Optoeletronics Conference, (10/10/2001 a 14/10/2001), Belem, PA, BRASIL, Oral: Laser reflectometry applied to the in situ etching control in an electron cyclotron resonance plasma system
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Nome do candidato
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Instituição
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Natureza
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Titular/Suplente
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Universidade de São Paulo
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Doutorado fora da Unicamp
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Titular
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WILLIAN AURELIO NOGUEIRA
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Universidade de São Paulo
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Exame de qualificação
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Titular
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Giovana da Silva Padilha
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Faculdade de Engenharia Química - Unicamp
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Exame de qualificação
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Titular
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Universidade de São Paulo
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Mestrado fora da Unicamp
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Titular
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Universidade de São Paulo
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Mestrado fora da Unicamp
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Titular
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Universidade de São Paulo
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Mestrado fora da Unicamp
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Titular
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Universidade de São Paulo
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Mestrado fora da Unicamp
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Titular
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Universidade de São Paulo
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Mestrado fora da Unicamp
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Titular
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Universidade de São Paulo
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Doutorado fora da Unicamp
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Titular
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Universidade de São Paulo
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Doutorado fora da Unicamp
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Titular
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Universidade de São Paulo
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Doutorado fora da Unicamp
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Titular
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Universidade Estadual de Campinas
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Concurso para provimento de Cargo de Professor Doutor
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Titular
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Glaucio Ribeiro da Silva
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Univesidade São Paulo
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Doutorado fora da Unicamp
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Titular
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Edson José de Carvalho
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Universidade Estadual de Campinas
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Doutor
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Titular
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Paula Ghedini Der Agopian
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EPUSP
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Doutorado fora da Unicamp
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Titular
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Milene Galeti
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Escola Politécnica da Universidade de São Paulo
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Doutorado fora da Unicamp
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Titular
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Leandro Poloni Dantas
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Centro Universitário da Faculdade de Engenharia Industrial - FEI
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Mestrado fora da Unicamp
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Titular
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Faculdade de Engenharia Elétrica e Computação - UNICAMP
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Outras bancas de avaliação
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Titular
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Iuri Stefani Brandt
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Universidade Federal de Santa Catarina
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Exame de qualificação Geral (DOUTORADO)
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Titular
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Daniel Manha Alati
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Centro Universitário da Faculdade de Engenharia Industrial - FEI
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Mestrado fora da Unicamp
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Titular
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Reinaldo Alberto Ricchi Junior
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Universidade Estadual de Campinas
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Exame de qualificação Geral (DOUTORADO)
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Titular
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Universidade do Estado do Amazonas
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Concurso para provimento de Cargo de Professor Doutor
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Presidente
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Universidade de São Paulo
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Concurso para provimento de Cargo de Professor Doutor
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Titular
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Cecilia de Carvalho Castro E Silva
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Universidade Estadual de Campinas
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Exame de qualificação de Área (DOUTORADO)
|
Titular
|
Thales Augusto Ribeiro
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Centro Universitário da FEI-Fundação Educac. Inaciana Pe Sabóia de Medeiros
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Mestrado fora da Unicamp
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Titular
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Marco Aurélio Keiler
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Universidade Estadual de Campinas
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Exame de qualificação de Área (MESTRADO)
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Presidente
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|
Universidade Estadual Campinas
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Concurso de Livre Docência
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Titular
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Vários
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Universidade Estadual Campinas
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Concurso para provimento de Cargo de Professor Doutor
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Titular
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Rodrigo Reigota César
|
Universidade Estadual de Campinas
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Exame de qualificação de Área (DOUTORADO)
|
Titular
|
Hugo da Silva Alvarez
|
Universidade Estadual de Campinas
|
Exame de qualificação de Área (MESTRADO)
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Presidente
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José Luis Arrieta Concha
|
Universidade Estadual de Campinas
|
Exame de qualificação Geral (DOUTORADO)
|
Presidente
|
Cássio Roberto de Almeida
|
Universidade Estadual de Campinas
|
Exame de qualificação de Área (DOUTORADO)
|
Presidente
|
Juliana Miyoshi
|
Universidade Estadual de Campinas
|
Exame de qualificação de Área (DOUTORADO)
|
Presidente
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Marcos Vinicius Puydinger dos Santos
|
Universidade Estadual de Campinas
|
Exame de qualificação de Área (DOUTORADO)
|
Presidente
|
Andressa Macêdo Rosa
|
Universidade Estadual de Campinas
|
Exame de qualificação de Área (DOUTORADO)
|
Presidente
|
Gilson de Lima Raeder
|
Universidade Estadual de Campinas
|
Exame de qualificação de Área (DOUTORADO)
|
Titular
|
Mário Eduardo de Barros Gomes N da Silva
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Universidade Estadual de Campinas
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Exame de qualificação de Área (DOUTORADO)
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Titular
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|
Universidade Estadual de Campinas
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Doutor
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Presidente
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Gustavo Adolfo Palomino Marcelo
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Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
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Osvaldo Corrêa
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Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
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Wilson José Freitas
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Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
|
Silas Demmy Yamamoto
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Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
André Luis do Couto
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Sergio Henrique Fernandes
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
|
Hugo Ricardo Jiménez Grados
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
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Ricardo Cotrin Teixeira
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
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Vitor Garcia
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Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Reinaldo Alberto Ricchi Junior
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
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Claudia Reyes Betanzo
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Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
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Hugo da Silva Alvarez
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Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
|
Hugo da Silva Alvarez
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Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Presidente
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Audrey Roberto Silva
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Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
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Rafael Oliveira Nunes
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Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
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Diego Deotti
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Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
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Lucas Barroso Spejo
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Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
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Estevão Strini Magro
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Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
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Pablo Rodrigo de Souza
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Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Marcos Vinicius Puydinger dos Santos
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Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
|
Marcos Vinicius Puydinger dos Santos
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Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Presidente
|
Rafael Cortês de Medeiros
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Rogério Valentim Gelamo
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
|
Marcus Anibal Pereira
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Roberto Ribeiro Neli
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
|
Regís Eugenio dos Santos
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Marcos Augusto de Goes
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Leonardo Breseghello Zoccal
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Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Presidente
|
Roberto Lacerda de Orio
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Luiz Gustavo Turatti
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
|
Francisco Tadeu Degasperi
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
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Membro
|
Clóvis Fischer
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
|
Edson José de Carvalho
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
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Membro
|
Alexandre Gorni Felicio
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
|
Juliana Miyoshi
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
|
Fernando de Souza Campos
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
|
Virginia Mansanares Giacon
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
|
Adeilton Cavalcante de Oliveira Júnior
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
|
Membro
|
Arline Maria Melo
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
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Membro
|
Arline Maria Melo
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
|
Presidente
|
Gleison Allan Manêra
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
|
Presidente
|
Nemer Paschoal Fioravante Junior
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
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Membro
|
Felipe Lorenzo Della Lucia
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
|
Membro
|
Giovana da Silva Padilha
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
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Membro
|
Alcinei Moura Nunes
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
|
Membro
|
Alessandro Camolesi
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
|
Membro
|
Cleber Biasotto
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
|
Cleber Biasotto
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
|
Presidente
|
Fábio Aparecido Cavarsan
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
|
Glaucio Pedro de Alcantara
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
|
Emilio Sergio Marins Vieira Pinto
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Alex Linardi Gomes
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
|
Pedro Emiliano Paro Filho
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
|
Rafael Novaes da Conceição
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
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Membro
|
David César Ardiles Saravia
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Presidente
|
Marcelo Macchi da Silva
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Lucas Petersen Barbosa Lima
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
|
Lucas Petersen Barbosa Lima
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Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Presidente
|
Luis Olavo de Toledo Fernandes
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Aline Maria Pascon de Marque
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Presidente
|
Fernando Zampronho Neto
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Membro
|
Marcel Veloso Campos
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
|
Angélica Denardi de Barros
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
|
Presidente
|
Angélica Denardi de Barros
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
|
Presidente
|
Wallace Alane Pimenta
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
|
Membro
|
André Luís Vilas Bôas
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
|
Membro
|
Gilliard Nardel Malheiros Silveira
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
|
Membro
|
Cecília de Carvalho Castro e Silva
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
|
Membro
|
André Luís Morás Junior
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
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Membro
|
Carlos Vinícius Carnio
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
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Presidente
|
Paula Simões Casagrande
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
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Membro
|
Jose Luis Ramirez Bohorquez
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
|
Membro
|
Selma Aparecida Lopes
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
|
Membro
|
Luiz Eduardo Bento Ribeiro
|
Universidade Estadual de Campinas
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DOUTORADO NA UNICAMP
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Membro
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Felipe Henrique de Souza da Fonseca
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
|
Membro
|
Mara Adriana Canesqui
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
|
Luís Francisco Pinotti
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
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Presidente
|
Fernando Cesar Rufino
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
|
Presidente
|
Lucas Stucchi-Zucchi
|
Universidade Estadual de Campinas
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MESTRADO NA UNICAMP
|
Presidente
|
Raphael Ronald Noal Souza
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
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Membro
|
Carlos Felipe Rezende Facchini
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
|
Membro
|
Andressa Macedo Rosa
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
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Presidente
|
Salomão Moraes da Silva Junior
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
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Membro
|
Salomão Moraes da Silva Junior
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
|
Membro
|
Rodrigo Reigota César
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
|
Membro
|
Rodrigo Reigota César
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
|
Presidente
|
Edgar Andres Patiño Nariño
|
|
DOUTORADO NA UNICAMP
|
Membro
|
Carlos Eduardo Teles
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
|
Membro
|
Vanessa Pereira Gomes
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
|
Membro
|
Vanessa Pereira Gomes
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
|
Membro
|
Cássio Roberto de Almeida
|
Universidade Estadual de Campinas
|
DOUTORADO NA UNICAMP
|
Presidente
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Catherine Pancotto
|
Universidade Estadual de Campinas
|
MESTRADO NA UNICAMP
|
Membro
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